Square Pixel Rasterization for Low-Roughness Digital Lithography
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Solution Overview
Problem
Existing digital lithography technologies face challenges in achieving high resolution due to line edge roughness (LER) and line width roughness (LWR) caused by non-symmetrical and non-orthogonal pixel patterns, such as hexagon shapes, which impede the development of sub-micron features.
Innovation Solution
Implementing square pixel patterns for rasterization in digital lithography systems, particularly using digital micromirror devices (DMDs), to improve resolution by reducing LER and LWR, and enhance the ability to rasterize diagonal lines effectively.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If non-symmetrical and non-orthogonal pixel patterns (e.g., hexagon shapes) are used for rasterization, then the device complexity is reduced, but the manufacturing precision deteriorates due to line edge roughness and line width roughness
Solution Approach 1:
The patent applies asymmetry principle by using non-symmetrical hexagon pixel patterns for rasterization. This allows the digital lithography system to achieve high-resolution patterning while maintaining manageable device complexity. The hexagonal geometry provides efficient space utilization and reduces the number of pixels needed compared to traditional square patterns, thereby reducing device complexity while maintaining or improving manufacturing precision.
2Ease of manufacture
If traditional rasterization methods are used, then the ease of manufacture is maintained, but the productivity deteriorates due to inability to achieve sub-micron feature resolution
Solution Approach 1:
The patent applies parameter changes by modifying the pixel pattern geometry from traditional square shapes to hexagonal shapes. This parameter change in the rasterization process enables the system to achieve sub-micron feature resolution while maintaining ease of manufacture. The hexagonal pixel pattern provides better spatial efficiency and reduces the total number of exposure steps required, thereby improving productivity for advanced packaging applications.
3Manufacturing precision
If high resolution patterning is pursued, then the manufacturing precision is improved, but the device complexity increases due to requirements for advanced packaging techniques
Solution Approach 1:
The patent applies segmentation by dividing the patterning process into discrete hexagonal pixel units that can be independently controlled and applied. This segmentation approach allows the system to achieve high manufacturing precision for sub-micron features while managing device complexity through modular processing. The hexagonal grid structure naturally segments the substrate into manageable units, facilitating complex packaging patterns without requiring overly complex system architecture.
Data Source
AI summary
A system includes a memory and at least one processing device, operatively coupled to the memory, to generate a square pixel pattern for rasterizing an image, rasterize the image using the square pixel pattern to generate a raster image, wherein the raster image is stored in a file usable by a digital lithography system, and cause the digital lithography system to pattern a substrate based on the raster image having the square pixel pattern.