Long/Short-Wordline SRAM Bit Cell Layout for IR Drop Control

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Solution Overview

Problem

Existing SRAM memory cells face performance limitations due to significant IR drops in bit and word lines, particularly for cells far from the read/write block, affecting speed and efficiency.

Innovation Solution

Optimized SRAM cell configuration with wider bit lines and narrower word lines, along with staggered interconnect structures to reduce IR drops, ensuring only one SRAM cell is activated at a time.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of energy

If conventional SRAM cell configuration is used, then manufacturing is simpler, but IR drops in bit and word lines increase significantly for cells far from read/write block

Engineering Contradiction:
ImproveIR dropVSAvoidinterconnect structure
Core Design Contradiction:
Loss of energyVSDevice complexity

Solution Approach 1:

The patent implements different line widths for bit lines and word lines based on their specific functional requirements and distance from the read/write block. Bit lines have wider widths to reduce resistance and IR drops, while word lines have narrower widths. This local differentiation of geometric properties optimizes electrical performance for each interconnect type according to its specific needs.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent employs asymmetric interconnect structures where bit lines and word lines have different geometric configurations. Specifically, bit lines are designed with greater width than word lines, creating an asymmetric layout that compensates for the different electrical demands of these two interconnect types. This asymmetry allows optimization of bit line resistance without unnecessarily increasing word line resistance.

Inventive Principle:
Principle #4Asymmetry

2Loss of energy

If bit line width is increased to reduce IR drop, then resistance decreases, but cell area increases

Engineering Contradiction:
ImproveIR dropVSAvoidcell area
Core Design Contradiction:
Loss of energyVSArea of stationary object

Solution Approach 1:

The patent applies different width characteristics to bit lines and word lines within the same SRAM cell. Bit lines are locally optimized with wider dimensions to reduce resistance and IR drops, while word lines maintain narrower dimensions. This localized quality differentiation allows the cell to achieve reduced IR drops in critical paths without proportionally increasing the overall cell area.

Inventive Principle:
Principle #3Local quality

Data Source

PatentUS12426226B2Macro and SRAM bit cell cooptimizatoin for performance (long/shortwordline combo SRAM)
Publication Date: 2025.09.23 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US12426226B2 patent drawing
  • US12426226B2 patent drawing
  • US12426226B2 patent drawing

AI summary

A memory device includes a memory array having a plurality of memory cells. Each memory cell of the plurality of memory cells is connected to a word line to apply a first signal to select the memory cell to read data from or write the data to the memory cell and a bit line to read the data from the memory cell or provide the data to write to the memory cell upon selecting the memory cell by the word line. A first bit line portion of the bit line connected to a first memory cell of the plurality of memory cells abuts a second bit line portion of the bit line connected to a second memory cell of the plurality of memory cells. The first memory cell is adjacent to the second memory cell.