Stacked Beam Deflector Layout for Charged Particle Aberration Correction
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Solution Overview
Problem
Existing beam deflection devices in charged particle beam systems face challenges in arranging electrodes and magnetic poles close to the beam trajectory due to interference concerns, limiting their ability to correct aberrations effectively.
Innovation Solution
A beam deflection device configuration where electrostatic deflectors and magnetic field deflectors are stacked along the beam trajectory, with overlapping electrodes and magnetic poles, generating orthogonal electric and magnetic fields to deflect the beam without interfering with each other, allowing for closer proximity to the beam path.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If electrodes and magnetic poles are spaced away from the beam trajectory to avoid interference, then device reliability is improved, but manufacturing precision and aberration correction effectiveness deteriorate
Solution Approach 1:
The patent transitions from a planar arrangement to a three-dimensional stacked configuration where electrostatic deflectors and magnetic field deflectors are arranged in alternating layers along the beam propagation direction. This vertical stacking enables electrodes and magnetic poles to be positioned close to the beam trajectory without lateral interference, as they occupy different spatial dimensions (z-axis layering rather than x-y plane proximity).
Solution Approach 2:
The patent implements a nested structure where multiple deflector components are integrated within a compact stacked assembly. The electrostatic and magnetic deflectors are interlaced in alternating layers, with each deflector unit containing electrodes or magnetic poles that are closely positioned to the beam path while being protected by the layered structure from interfering with opposing field sources.
2Manufacturing precision
If electrodes and magnetic poles are arranged close to the beam trajectory, then manufacturing precision and aberration correction are improved, but device complexity increases due to potential interference
Solution Approach 1:
The patent divides the deflection system into discrete stacked layers, with each layer containing either electrostatic or magnetic deflectors. This segmentation allows independent optimization of each deflector type while maintaining close proximity to the beam trajectory. The modular layered structure reduces overall device complexity by organizing components into repeatable units that can be independently designed and assembled.
3Measurement precision
If a Wien filter is used to deflect beams, then beam trajectory control is improved, but device complexity increases and electrodes/magnetic poles cannot be arranged close to the beam trajectory
Solution Approach 1:
The patent replaces the conventional Wien filter configuration with a stacked layered arrangement where electrostatic and magnetic deflectors are positioned in alternating layers along the beam propagation direction. This dimensional reorganization enables close spacing of electrodes and magnetic poles to the beam trajectory without the structural constraints of traditional Wien filter designs, achieving both precise trajectory control and compact geometry.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise aberration correction and beam deflection by allowing electrodes and magnetic poles to be arranged closer to the beam trajectory, improving the resolution and efficiency of charged particle beam devices like electron microscopes.
Implementation Method 1
one or more electrostatic deflectors that include a pair of electrodes arranged to sandwich therebetween a beam trajectory in a first direction orthogonal to the trajectory of the beam
Implementation Method 2
one or more magnetic field deflectors that include a pair of magnetic poles arranged to sandwich therebetween the beam trajectory in a second direction orthogonal to the trajectory of the beam and the first direction
Implementation Method 3
the one or more electrostatic deflectors and the one or more magnetic field deflectors are stacked along the trajectory of the beam so that at least a portion of the pair of electrodes overlap the pair of magnetic poles as seen from an incident direction of the beam
Data Source
AI summary
The present disclosure pertains to a beam deflection device capable of properly deflecting a beam. The present disclosure provides a beam deflection device for deflecting a beam inside a charged particle beam device, said beam deflection device being provided with: one or more electrostatic deflectors (207, 208) each having a pair of electrodes disposed so as to face each other across a beam path in a first direction orthogonal to the beam path; and one or more magnetic deflectors (209) each having a pair of magnetic poles disposed so as to face each other across the beam path in a second direction orthogonal to the beam path and to the first direction. When viewed from an incident direction of the beam, the one or more electrostatic deflectors and the one or more magnetic deflectors are stacked along the beam path such that the pair of electrodes at least partially overlap with the pair of magnetic poles and with a gap between the pair of magnetic poles.