Stacked Gas Distribution Plates for Plasma Uniformity
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Solution Overview
Problem
The existing substrate processing apparatuses face challenges in uniformly distributing plasma across a processing space due to limitations in the number of gas diffusion spaces, which is exacerbated by the need for more precise micro-processing of larger wafers during plasma processes like dry etching.
Innovation Solution
A gas supply device with multiple gas distribution plates and a shower head configuration that includes a facing plate, gas distribution plates, and a cover plate, where each gas distribution plate has branched gas supply paths with uniform distances and conductances to increase the number of gas diffusion spaces, allowing for more regions to be formed in the processing space.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple gas supply grooves are formed in a single gas distribution plate, then the processing gas can be supplied uniformly to multiple regions, but the number of gas diffusion spaces is limited due to interference between gas supply grooves
Solution Approach 1:
The gas distribution plate is divided into multiple separate gas distribution plates, each with its own gas supply grooves and gas diffusion spaces. This segmentation eliminates interference between grooves while maintaining uniform gas distribution in each region, allowing the processing space to be divided into more regions without compromising uniformity.
Solution Approach 2:
The solution transitions from a single-plane gas distribution plate to a multi-layer stacked configuration of gas distribution plates. By adding the vertical dimension (stacking plates), the system can accommodate more gas diffusion spaces without increasing the complexity of individual groove paths on a single plate.
2Manufacturing precision
If the number of gas diffusion spaces is increased to distribute plasma more uniformly, then plasma uniformity improves, but the device structure becomes more complex
Solution Approach 1:
The gas distribution system is segmented into multiple independent gas distribution plates, each responsible for a specific region. This allows the processing space to be divided into more regions with uniform plasma distribution while keeping each individual plate's structure relatively simple and manageable.
Solution Approach 2:
Multiple gas distribution plates are stacked in a nested configuration, with each plate containing gas diffusion spaces for specific regions. This nested arrangement allows multiple gas diffusion spaces to be integrated in a compact structure without excessive complexity, as each plate follows a similar design pattern.
Data Source
AI summary
A gas supply device of supplying a gas into a processing space from a gas supply source includes a facing plate that faces the processing space and includes multiple through holes; multiple gas distribution plates; and a cover plate. The facing plate, the gas distribution plates, and the cover plate are stacked in sequence. In a surface, which faces the facing plate, of the gas distribution plate closest to the facing plate, multiple gas diffusion spaces including a first gas diffusion space and a second gas diffusion space are formed, and in each of the gas distribution plates, a first gas supply path through which a processing gas or an additional gas is supplied into the first gas diffusion space and a second gas supply path through which the processing gas or the additional gas is supplied into the second gas diffusion space are formed.