Stacked Semiconductor Memory Layout for Smaller CMOS Chip Area

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Solution Overview

Problem

The area of a semiconductor chip cannot be reduced effectively unless the area of the CMOS circuit is also minimized, as it is often determined by the size of the CMOS circuit, making it challenging to downsize the chip while maintaining efficient memory cell array operations.

Innovation Solution

The semiconductor device incorporates a CMOS circuit composed of transistors on two substrates, allowing for the reduction of the chip's area by distributing the transistors and memory cell array across multiple substrates, with one substrate having low-voltage transistors and the other high-voltage transistors, enabling flexible thickness adjustments to optimize chip size and functionality.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of stationary object

If the area of the memory cell array is reduced, then the area of the semiconductor chip can be reduced, but the area of the CMOS circuit also needs to be reduced to achieve effective chip downsizing

Engineering Contradiction:
Improvearea of semiconductor chipVSAvoidcomplexity of CMOS circuit
Core Design Contradiction:
Area of stationary objectVSDevice complexity

Solution Approach 1:

The patent divides the CMOS circuit into two separate substrates: a first substrate containing first transistors and a second substrate containing second transistors. This segmentation allows independent optimization of each substrate's area and complexity, enabling the memory cell array area to be reduced without being constrained by a monolithic CMOS circuit layout. The circuit functionality is distributed across substrates, achieving chip downsizing while managing complexity.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent transitions from a two-dimensional planar integration of CMOS circuits to a three-dimensional stacked architecture where multiple substrates are vertically arranged. The first and second substrates are positioned at different vertical levels, with the memory cell array spanning across them. This dimensional change allows the CMOS circuit area to be decoupled from the memory cell array area, enabling independent optimization and effective chip downsizing.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Area of stationary object

If transistors are distributed across multiple substrates, then the chip area can be minimized, but the structural complexity of the device increases

Engineering Contradiction:
Improvearea of semiconductor chipVSAvoidstructural complexity of multi-substrate device
Core Design Contradiction:
Area of stationary objectVSDevice complexity

Solution Approach 1:

The patent creates a universal substrate structure where both the first substrate and second substrate serve dual purposes: they individually host transistors for the CMOS circuit while collectively supporting the memory cell array structure. The substrates function as both circuit carriers and structural foundations for the vertical memory architecture, reducing the need for additional support structures and minimizing overall chip area despite the multi-substrate configuration.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The patent implements a nested arrangement where the memory cell array structure is vertically integrated across the first and second substrates. The substrates are positioned within the same vertical footprint, with the memory cell array spanning between them. This nesting allows the multi-substrate structure to occupy minimal planar area while maintaining the necessary structural complexity for distributed transistor implementation.

Inventive Principle:
Principle #7Nested doll (Nesting)

Data Source

PatentUS20230413566A1Semiconductor device and method of manufacturing the same
Publication Date: 2023.12.21 KIOXIA CORP
  • US20230413566A1 patent drawing
  • US20230413566A1 patent drawing
  • US20230413566A1 patent drawing

AI summary

In one embodiment, a semiconductor device includes a first substrate, a first transistor provided on an upper face of the first substrate, and a memory cell array provided above the first transistor. The device further includes a second substrate provided above the memory cell array, and a second transistor provided on an upper face of the second substrate.