Stacked Pixel Transistor Gate Layout for Lower Imaging Noise

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Solution Overview

Problem

Solid-state imaging devices face challenges in reducing noise in the signals outputted from pixel transistors, which affects image quality.

Innovation Solution

A solid-state imaging device is designed with a stacked structure of three substrates, including a first substrate with a photoelectric converter and electric charge accumulation section, a second substrate with a semiconductor layer and pixel transistor, and through electrodes that electrically couple the substrates, allowing the gate electrode of the pixel transistor to be in contact with the through electrode, thereby increasing the gate electrode area.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the gate electrode is disposed apart from the through electrode, then the structure is simpler, but the area of the gate electrode is reduced leading to increased noise

Engineering Contradiction:
Improvesignal-to-noise ratioVSAvoidstructural complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The gate electrode is merged with the through electrode by making them partially contact each other. This combining of structures increases the effective area of the gate electrode without adding separate components, thereby improving the signal-to-noise ratio while avoiding excessive structural complexity

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The gate electrode extends in the thickness direction of the semiconductor layer to contact the through electrode. This three-dimensional configuration increases the gate electrode area by utilizing the vertical dimension, which improves noise characteristics without increasing the planar footprint

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Reliability

If the gate electrode area is increased by contacting the through electrode, then noise is reduced, but the manufacturing precision requirements increase

Engineering Contradiction:
Improvesignal-to-noise ratioVSAvoidalignment precision
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

The design anticipates alignment variations by creating a partial contact structure between the gate electrode and through electrode. This configuration provides a tolerance buffer that accommodates manufacturing variations while still achieving the desired electrical connection and noise reduction

Inventive Principle:
Principle #11Beforehand cushioning (Prior cushioning)

Solution Approach 2:

Instead of requiring complete contact or perfect alignment, the invention uses partial contact between the gate electrode and through electrode. This partial action approach achieves sufficient electrical connection and noise reduction without demanding excessive manufacturing precision

Inventive Principle:
Principle #16Partial or excessive action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration reduces noise in the signal output from the pixel transistor, improving image quality by enhancing the signal-to-noise ratio.

Implementation Method 1

a through electrode that is provided in the first substrate and the second substrate, and electrically couples the first substrate and the second substrate to each other

Methodology Applied
Scientific EffectElectrical conduction: Conduction (electrical)

Implementation Method 2

a first substrate including a photoelectric converter and an electric charge accumulation section for each pixel, the electric charge accumulation section in which a signal electric charge generated in the photoelectric converter is accumulated

Methodology Applied
Scientific EffectPhotoelectric conversion: Photoelectric Effect

Data Source

PatentUS12183757B2Solid-state imaging device
Publication Date: 2024.12.31 SONY SEMICON SOLUTIONS CORP
  • US12183757B2 patent drawing
  • US12183757B2 patent drawing
  • US12183757B2 patent drawing

AI summary

There is provided a solid-state imaging device including: a first substrate including a photoelectric converter and an electric charge accumulation section for each pixel, the electric charge accumulation section in which a signal electric charge generated in the photoelectric converter is accumulated; a second substrate including a semiconductor layer and a pixel transistor, the semiconductor layer being stacked on the first substrate, and the pixel transistor that includes a gate electrode opposed to the semiconductor layer, and reads the signal electric charge of the electric charge accumulation section; and a through electrode that is provided in the first substrate and the second substrate, and electrically couples the first substrate and the second substrate to each other and is partially in contact with the gate electrode.