Stacked Tray Particle Coating for Uniform Insulating Films
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Solution Overview
Problem
Existing particle coating apparatuses, such as those described in JP-A-2021-085050, face inefficiencies in producing insulating films due to limitations in the amount of particles that can be processed at once, leading to reduced production efficiency.
Innovation Solution
A particle coating apparatus and method that utilizes a chamber with multiple trays stacked at a controlled gap, allowing for efficient gas and oxidant entry, and includes a heating unit to optimize film formation, enabling uniform film thickness and increased production capacity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple trays are stacked to increase production capacity, then productivity increases, but gas flow distribution and film uniformity deteriorate
Solution Approach 1:
The gas introduction system is segmented into multiple independent gas introduction units, one for each tray. This allows individual control of gas flow to each tray, ensuring uniform film formation even when multiple trays are stacked. Each gas introduction unit can be independently adjusted to compensate for variations in gas distribution across different tray positions.
Solution Approach 2:
The gas flow rates to each tray are made dynamically adjustable through independent gas introduction units. This enables real-time optimization of gas distribution patterns to account for positional variations, maintaining film uniformity while processing multiple trays simultaneously. The system can adapt gas flow parameters based on the specific configuration and position of each tray.
2Productivity
If particle loading is increased to improve productivity, then production efficiency increases, but film thickness uniformity deteriorates
Solution Approach 1:
The system segments the particle processing into multiple independent trays, each with its own gas introduction unit. This allows each tray to be optimized for uniform film formation while collectively increasing production capacity. The segmentation enables parallel processing of multiple particle batches without compromising film quality in any individual tray.
Solution Approach 2:
Each tray is provided with localized gas introduction capabilities, allowing the gas flow parameters to be optimized specifically for the particle loading and configuration in that particular tray. This local optimization ensures uniform film formation in each tray regardless of the overall system configuration or total particle loading.
3Volume of stationary object
If tray gap is reduced to increase space utilization, then space efficiency increases, but gas flow distribution and film uniformity deteriorate
Solution Approach 1:
The gas flow system is made dynamic and adaptive, with each tray having independent gas introduction control. This allows the system to compensate for reduced tray gaps by adjusting gas flow patterns to ensure proper gas distribution and film uniformity even when trays are closely spaced to maximize space utilization.
Solution Approach 2:
The gas flow parameters (flow rate, pressure, distribution pattern) can be changed and optimized for each tray configuration. When trays are stacked with reduced gaps, the gas introduction parameters are adjusted to maintain adequate gas flow distribution and film formation quality despite the tighter spatial constraints.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus and method enable the formation of uniform and dense insulating films on particles, enhancing magnetic properties and insulating properties while increasing production efficiency and space utilization.
Implementation Method 1
a heating unit configured to heat an inside of the chamber
Implementation Method 2
forming an insulating film on the surfaces of the particles of the magnetic powder using various film formation methods. For example, JP-A-2021-085050 discloses a particle coating apparatus that forms an insulating film on a surface of a soft magnetic metal particle by an atomic layer deposition (ALD) method
Data Source
AI summary
A particle coating apparatus 1 includes: a chamber 11 having a volume of 10 L to 100 L; a gas introduction unit 16 provided at the chamber 11 and configured to introduce a predetermined gas into the chamber 11; a gas discharge unit 18 provided at the chamber 11 and configured to discharge the gas in the chamber 11; a heating unit 15 configured to heat an inside of the chamber 11; a plurality of trays 12 accommodated in the chamber 11 and configured to hold metal particles 31 and form a powder layer 30 at a predetermined depth; and a valve 21 coupled to the gas introduction unit 16 and a valve 23 provided at the gas discharge unit 18. The plurality of trays 12 are stacked at a gap of 5 mm or more and 200 mm or less, and a conductance between the trays 12 in an atmosphere at 20° C. is 20 m3/s to 2.0×104 m3/s.