Stage Mechanism Position Correction via 2D Distortion Mapping
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Solution Overview
Problem
Miniaturization of semiconductor devices has led to increased errors in stage position measurement due to minute mirror distortions, which are not accurately corrected by existing methods, especially with the miniaturization of laser interferometer systems.
Innovation Solution
A method involving laser interferometry to measure stage positions in multiple directions with adjusted laser beam spot diameters to create a two-dimensional map of distortion, allowing for precise correction of positional data for accurate pattern writing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Volume of moving object
If the laser beam spot diameter is reduced to miniaturize the laser interferometer system, then the device size is reduced, but the measurement precision deteriorates due to increased sensitivity to mirror distortions
Solution Approach 1:
The patent applies parameter changes by measuring the laser beam spot diameter and using this information to dynamically adjust measurement parameters. The system changes the measurement approach based on the spot diameter size, allowing miniaturization while maintaining precision through adaptive parameter selection.
Solution Approach 2:
The patent implements feedback by measuring the laser beam spot diameter and using this measurement to determine subsequent measurement parameters and correction strategies. The system continuously monitors spot diameter and adjusts the measurement process accordingly, creating a closed-loop control system that maintains precision despite size reduction.
2Ease of manufacture
If existing correction methods are used for mirror distortions, then the correction process is simple, but the manufacturing precision deteriorates due to inaccurate correction of positional deviations
Solution Approach 1:
The patent changes the correction approach by selecting different correction parameters based on the measured laser beam spot diameter. When the spot diameter is small, the system applies more sophisticated correction methods that account for mirror distortions, while using simpler methods when the spot diameter is large, thus maintaining both ease of manufacture and manufacturing precision.
Solution Approach 2:
The patent applies local quality by using different correction strategies for different measurement conditions. The correction method is tailored to the specific spot diameter and distortion characteristics, applying appropriate correction levels locally rather than using a uniform approach, thereby improving precision without excessive complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively reduces measurement errors caused by mirror distortions, enabling more accurate position correction and pattern writing even with reduced laser beam spot diameters, enhancing the precision of semiconductor device manufacturing.
Implementation Method 1
measuring a first direction position of a stage by a laser interferometry technique using a first laser beam to be irradiated to the stage
Data Source
AI summary
According to one aspect of the present invention, a method of correcting a position of a stage mechanism, includes generating a two-dimensional map of a distortion amount at a position of a stage by applying a distortion amount of a position in a first direction of the stage at each of measured positions in a second direction as a distortion amount of a position in the first direction of the stage at each position in the second direction at each position in the first direction and by applying a distortion amount of a position in the second direction of the stage at each of measured positions in the first direction as a distortion amount of a position in the second direction of the stage at each position in the first direction at each position in the second direction; and correcting position data by using the two-dimensional map.