Roll Cleaning Member with Staggered Protrusions for Uniform Substrate Scrubbing
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Solution Overview
Problem
Roll cleaning devices with nodules on the surface experience cleaning unevenness due to concentrated stress and deformation of nodules during substrate cleaning, leading to concentric cleaning issues.
Innovation Solution
The cleaning device is designed with a roll cleaning member having protruding members arranged in a staggered pattern and oscillating during contact with the substrate, ensuring continuous high cleaning force regions without gaps in the radial direction, thereby alleviating cleaning unevenness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a roll cleaning member with nodules is used for substrate cleaning, then cleaning capability is improved, but cleaning unevenness occurs due to concentrated stress and nodule deformation
Solution Approach 1:
The roll cleaning member is divided into multiple nodule rows arranged in the longitudinal direction, with each row containing multiple nodules. The nodules in adjacent rows are offset from each other, creating a segmented structure that distributes cleaning stress across multiple contact points rather than concentrating it at single locations, thereby reducing cleaning unevenness and deformation.
Solution Approach 2:
The nodules in adjacent rows are intentionally offset asymmetrically relative to each other in the longitudinal direction. This asymmetric arrangement ensures that the high cleaning force regions do not align perfectly, creating overlapping cleaning zones that eliminate gaps and prevent concentric cleaning unevenness on the substrate surface.
2Ease of manufacture
If nodules are arranged in parallel rows on the roll cleaning member, then manufacturing is simplified, but gaps appear in cleaning coverage causing concentric unevenness
Solution Approach 1:
The nodules in adjacent rows are offset asymmetrically in the longitudinal direction, breaking the perfect parallel alignment. This asymmetric offset ensures that when the roll rotates and contacts the substrate, the high cleaning force regions from different rows overlap rather than leaving gaps, thereby achieving continuous cleaning coverage without concentric unevenness while maintaining relatively simple manufacturing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration prevents or reduces concentric cleaning unevenness by ensuring consistent high cleaning force distribution across the substrate surface, enhancing cleaning efficiency and reducing substrate surface irregularities.
Implementation Method 1
the roll cleaning member having a plurality of protruding members provided thereon which are arrayed in the longitudinal direction and slidably contact the surface of the substrate, thereby cleaning the substrate
Implementation Method 2
scrub cleaning of relatively moving a cleaning member and the substrate in a state in which the cleaning member has been brought into contact with the surface of the substrate
Data Source
AI summary
The present invention prevents or alleviates cleaning unevenness in cleaning of a substrate with the use of a roll cleaning member having protruding members. The roll cleaning device includes: a substrate support member that supports and rotates a substrate W; and an upper roll cleaning member (52) for scrub cleaning a surface of the substrate W which is rotated by the substrate support member, while rotating. The upper roll cleaning member (52) has a plurality of protruding members provided thereon that are arrayed in the longitudinal direction thereof, and slidably contact the surface of the substrate W. The roll cleaning device cleans the substrate W so that the trajectories of high cleaning force regions out of the parts of the protruding members which slidably contact the substrate W are present without a gap in a radial direction of the substrate W.