Standard Cell Layout With Shared Pattern Regions
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Solution Overview
Problem
Current methods for designing semiconductor device layouts are inefficient in terms of integration and reliability, as they do not effectively utilize common pattern regions to optimize the arrangement of standard cells, leading to suboptimal use of space and potential electrical issues.
Innovation Solution
The method involves preparing a standard cell library with information on standard cells, determining a common active pattern or pattern region that considers local layout effects, and arranging standard cells to either overlap or share this common pattern region, depending on the width compatibility, to enhance integration and reliability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If standard cells are arranged without considering common pattern regions, then the layout design process is simpler, but the integration and reliability are reduced
Solution Approach 1:
The patent applies preliminary action by pre-defining common pattern regions and their characteristics before the actual cell placement process. The system identifies and stores common patterns (such as diffusion regions, contact regions, and interconnect structures) that appear across multiple standard cells, then uses these pre-defined patterns during layout generation to ensure consistency and improve reliability without requiring complex real-time analysis during placement.
Solution Approach 2:
The patent utilizes parameter changes by modifying the representation and organization of layout data. It transforms the traditional cell-by-cell design approach into a pattern-based approach where common geometric and electrical parameters are extracted, standardized, and reused across multiple cells. This parameter standardization enables improved reliability while maintaining design efficiency.
2Reliability
If common pattern regions are added to all standard cells, then consistency and reliability improve, but the placement area increases
Solution Approach 1:
The patent applies merging by combining adjacent common pattern regions when they are identical or compatible. When multiple standard cells share the same common pattern characteristics (such as identical diffusion regions or contact structures), the system merges these patterns into shared regions that serve multiple cells simultaneously. This reduces redundant area while maintaining the consistency and reliability benefits of standardized patterns.
Solution Approach 2:
The patent implements universality by designing common pattern regions that can serve multiple functions and multiple cells. A single common pattern region can provide electrical connectivity, mechanical support, and signal routing functions for several adjacent standard cells. This multi-functional approach ensures consistent performance across cells while minimizing the total area required, as the same pattern structure serves multiple purposes.
3Productivity
If common pattern regions are used to optimize cell arrangement, then integration improves, but the design process becomes more complex
Solution Approach 1:
The patent applies copying by creating reusable templates of common pattern regions that can be automatically instantiated across multiple standard cells. Once a common pattern is identified and validated, it is copied and applied to all cells requiring that pattern, ensuring consistency while dramatically reducing the manual design effort. The system manages the complexity of pattern identification and matching through automated algorithms, allowing designers to benefit from standardized patterns without bearing the burden of manual pattern creation and verification for each cell.
Data Source
AI summary
A method of designing a layout of a semiconductor device, includes: preparing a standard cell library including information on standard cells; determining a layout of a common pattern region in consideration of a local layout effect based on the standard cell library; adding the common pattern region having a cell height that is identical to a cell height of each of the standard cells to opposite sides of one or more of the standard cells; and arranging the standard cells to share the common pattern region between at least one pair of adjacent ones of the standard cells.