Standby Chamber Gas Flow Layout for Uniform Substrate Cooling

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Solution Overview

Problem

Existing substrate processing systems face inefficiencies in cooling substrates in standby chambers, leading to non-uniform temperature distribution and prolonged cooling times.

Innovation Solution

A substrate processing apparatus with a support system that aligns substrates vertically and uses multiple inert gas suppliers to supply inert gas from different directions, optimizing gas flow and temperature distribution, and an exhaust system to manage pressure and gas retention.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Temperature

If inert gas is supplied to substrates in a standby chamber, then cooling of substrates is achieved, but cooling efficiency is insufficient and cooling time is prolonged

Engineering Contradiction:
Improvesubstrate temperatureVSAvoidcooling time
Core Design Contradiction:
TemperatureVSLoss of time

Solution Approach 1:

The patent applies dimensionality change by supplying inert gas from multiple directions (front, rear, and side surfaces) rather than a single direction. This multi-directional gas supply approach transforms the cooling process from one-dimensional to three-dimensional, enabling simultaneous cooling of both surfaces and edges of the substrate, thereby significantly reducing cooling time and improving cooling efficiency.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Temperature

If inert gas is supplied to substrates in a standby chamber, then cooling is achieved, but inert gas consumption is excessive

Engineering Contradiction:
Improvesubstrate temperatureVSAvoidinert gas consumption
Core Design Contradiction:
TemperatureVSLoss of substance

Solution Approach 1:

The patent implements local quality by directing inert gas to specific regions of the substrate based on their cooling needs. Gas is supplied to the front surface, rear surface, and side edges through separately controlled suppliers, allowing optimized gas distribution that reduces overall consumption while ensuring effective cooling of all substrate regions.

Inventive Principle:
Principle #3Local quality

3Volume of moving object

If substrates are placed vertically on a support, then space utilization is improved, but temperature distribution uniformity deteriorates

Engineering Contradiction:
Improvestandby chamber space utilizationVSAvoidtemperature distribution uniformity
Core Design Contradiction:
Volume of moving objectVSStability of the object's composition

Solution Approach 1:

The patent applies segmentation by dividing the substrate into multiple cooling zones (front surface, rear surface, and side edges) and providing dedicated inert gas suppliers for each zone. This segmented approach ensures uniform temperature distribution across the entire substrate by addressing the thermal needs of each region independently, even when substrates are vertically positioned to maximize space utilization.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enhances cooling efficiency by shortening cooling times and reducing inert gas usage, while minimizing temperature gradients and particle re-attachment on substrates.

Implementation Method 1

a plurality of inert gas suppliers that supplies an inert gas in a direction along a surface of each of the plurality of substrates placed on the support

Methodology Applied
Scientific EffectConvection: Convection

Data Source

PatentUS20250308944A1Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
Publication Date: 2025.10.02 KOKUSAI DENKI KK
  • US20250308944A1 patent drawing
  • US20250308944A1 patent drawing
  • US20250308944A1 patent drawing

AI summary

A technique is provided including: a housing constituting a standby chamber in which a plurality of substrates is caused to stand by; a support capable of placing each of the plurality of substrates in a vertical direction inside the housing; and a plurality of inert gas suppliers that supplies an inert gas in a direction along a surface of each of the plurality of substrates placed on the support, in which at least one of the plurality of inert gas suppliers supplies the inert gas toward each of the plurality of substrates from a direction different from a direction of another inert gas supplier.