Star-Shaped Polymers with Azide Crosslinking for Low-Dosage UV Dielectric Layers
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Solution Overview
Problem
Current dielectric materials, such as polystyrene, require either an inert gas atmosphere or high radiation dosages for effective crosslinking, making the process inefficient and costly for field effect transistors (FETs).
Innovation Solution
A composition comprising a polymer with one polymerblock A and at least two polymerblocks B, along with a crosslinking agent carrying at least two azide groups, which allows for improved crosslinkability under low-dosage UV radiation and ambient conditions, enabling efficient formation of a stable dielectric layer in FETs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If polystyrene is used as dielectric material with bis-azide crosslinking agent, then crosslinking can be initiated by UV radiation, but high radiation dosage or inert gas atmosphere is required to achieve effective crosslinking
Solution Approach 1:
The patent changes the chemical structure parameters of the dielectric material by using polymers with vinyl groups (C=C bonds) instead of polystyrene. This parameter change enables the material to undergo efficient crosslinking reactions with azide groups under low-dosage UV radiation, resolving the contradiction between crosslinking effectiveness and radiation dosage requirement
Solution Approach 2:
The patent creates a composite system combining specific polymer materials containing vinyl functional groups with azide-based crosslinking agents. This composite material approach enables efficient crosslinking under ambient conditions with low radiation dosage, eliminating the need for inert gas atmosphere or high energy input
2Ease of manufacture
If thermal treatment is used for crosslinking, then the process is simple, but the structuring step must be performed separately using photolithography
Solution Approach 1:
The patent merges the crosslinking function and photolithography structuring function into a single UV irradiation step. The azide-containing crosslinking agent serves dual purposes: enabling crosslinking upon UV exposure and acting as a photoresist for patterning, thereby combining two previously separate steps into one
Solution Approach 2:
The UV irradiation process is given multiple functions: it simultaneously initiates crosslinking of the dielectric layer and performs photolithographic patterning. This multi-functional approach eliminates the need for separate thermal crosslinking and photolithography steps, simplifying the overall manufacturing process
3Stability of the object's composition
If orthogonal solvents are used to prevent dissolution of existing layers, then layer stability is maintained, but solvent selection is restricted
Solution Approach 1:
The patent applies preliminary crosslinking to the dielectric layer before applying subsequent layers. By pre-crosslinking the first dielectric layer, it becomes insoluble to subsequent solvents, eliminating the need to carefully select orthogonal solvents for each layer and enabling greater flexibility in solvent choice for later processing steps
4Reliability
If high radiation dosage is used for crosslinking, then effective crosslinking is achieved, but the process becomes inefficient and costly
Solution Approach 1:
The patent changes the chemical reactivity parameters by selecting polymers with vinyl groups that have high reactivity toward azide crosslinking agents. This parameter change allows effective crosslinking to occur at much lower radiation dosages, dramatically improving process efficiency and reducing costs while maintaining crosslinking effectiveness
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution provides a high film retention ratio and stability of the dielectric layer, allowing for efficient layer formation and patterning without dissolving existing layers, thus simplifying the manufacturing process and reducing costs.
Implementation Method 1
The commonly used dielectric material in WO 2015/004563 is polystyrene. However, polystyrene as dielectric material has the disadvantage that the crosslinking reaction with the bis-azide crosslinking agent has to be performed either under inert gas atmosphere such as nitrogen atmosphere or using a high dosage of radiation
Data Source
AI summary
The present invention provides compositions comprising a) at least one polymer consisting of one polymerblock A and at least two polymerblocks B, wherein each polymerblock B is attached to the polymerblock A, and wherein at least 60 mol % of the monomer units of polymerblock B are selected from the group consisting of Formulae (1A), (1B), (1C), (1D), (1E), (1F) and 1G, 1H and 1I wherein R1, R2, R3, R4, R5, R6, R7 and R8 are independently and at each occurrence H or C1-10-alkyl, and b) at least one crosslinking agent carrying at least two azide groups, as well as to layers formed from these compositions, electronic devices comprising these layers and to specific polymers encompassed by the polymers of the composition.