STED Projection Stereolithography Resolution Enhancement

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Solution Overview

Problem

Current additive manufacturing techniques, such as projection microstereolithography, face limitations in achieving high resolution due to the diffusion of polymerization species beyond the projected image boundaries, leading to decreased feature precision and increased part size.

Innovation Solution

The system employs stimulated emission depletion (STED) in conjunction with projection microstereolithography, using a primary and secondary optical signal to activate and then deplete polymerization species, respectively, thereby enhancing the resolution of the 3D part by controlling the polymerization process layer by layer.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If projection microstereolithography is used to form 3D parts, then productivity is improved through layer-by-layer manufacturing, but manufacturing precision deteriorates due to diffusion of polymerization species beyond projected image boundaries

Engineering Contradiction:
Improvelayer-by-layer manufacturing speedVSAvoidfeature resolution
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent applies preliminary anti-action by using a second wavelength light to preemptively deplete polymerization species at the boundaries of the projected image before they can diffuse outward. This creates a depletion zone that acts as a barrier, preventing the polymerization species from spreading beyond the intended feature boundaries, thus maintaining sharp edges and high resolution while preserving the productivity of layer-by-layer manufacturing.

Inventive Principle:
Principle #9Preliminary anti-action

2Ease of manufacture

If conventional single-wavelength photopolymerization is used, then ease of manufacture is maintained with simple optical systems, but manufacturing precision is limited by diffusion of excited species

Engineering Contradiction:
Improveoptical system simplicityVSAvoidfeature boundary sharpness
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent changes the wavelength parameter of the light source to resolve the contradiction. A first wavelength is used to excite polymerization species within the projected image, while a second wavelength is used to deplete these species at the boundaries. This parameter change enables precise control over the polymerization process, achieving sharp feature boundaries without significantly complicating the manufacturing approach.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The second wavelength light acts as an intermediary that mediates the polymerization process by selectively depleting polymerization species at the boundaries. This intermediary mechanism allows the system to maintain simple layer-by-layer manufacturing while achieving high precision, as the second wavelength light serves as a control element that refines the feature boundaries without requiring complete system redesign.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach allows for the creation of 3D parts with significantly improved feature resolution and faster production, as the secondary optical signal rapidly terminates polymerization, preventing diffusion and maintaining sharp features, outperforming conventional STED/PUSL methods.

Implementation Method 1

At least a first one of the optical images enables activation of a polymerization species of a photo-sensitive resin in accordance with illuminated areas thereof, to thus cause polymerization of select portions of the photo-sensitive resin

Methodology Applied
Scientific EffectPhotopolymerization: Photopolymerisation

Implementation Method 2

At least a second one of the optical images enables stimulated emission depletion of subportions of the polymerization species, simultaneously, over various areas of the layer, to enhance resolution

Methodology Applied
Scientific EffectStimulated emission depletion:

Data Source

PatentUS11072160B2System and method for stimulated emission depletion projection stereolithography
Publication Date: 2021.07.27 LAWRENCE LIVERMORE NAT SECURITY LLC
  • US11072160B2 patent drawing
  • US11072160B2 patent drawing
  • US11072160B2 patent drawing

AI summary

The present disclosure relates to a system for forming a three dimensional (3D) part. The system may incorporate a beam delivery subsystem for generating optical signals, and a mask subsystem that receives the optical signals and generates optical images therefrom. A first one of the optical images activates a polymerization species of a photo-sensitive resin in accordance with illuminated areas thereof, to thus cause polymerization of select portions of the photo-sensitive resin to help form a layer of the 3D part. A second one of the optical images causes stimulated emission depletion of subportions of the polymerization species, simultaneously, over various areas of the layer, to enhance resolution of at least one subportion of the select portions of the photo-sensitive resin.