Stencil Mask with Segmented Openings for Nanoimprint Alignment

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Solution Overview

Problem

In nanoimprint processes, the boundary between a nanoimprint resist and a template becomes invisible due to equal optical properties, making it difficult to align the template accurately during charging, as existing methods lack sufficient contrast for visibility.

Innovation Solution

A stencil mask with specific openings is used to implant ions differently at the corners of mark regions on the template, improving ion distribution and contrast for better alignment visibility by varying the ion permeability and distribution.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If ions are implanted via a stencil mask to create alignment marks, then the alignment visibility is improved, but the ion distribution uniformity deteriorates due to corner effects

Engineering Contradiction:
Improvealignment visibilityVSAvoidion distribution uniformity
Core Design Contradiction:
Measurement precisionVSManufacturing precision

Solution Approach 1:

The patent applies local quality by making different regions of the stencil mask have different opening sizes. Specifically, the mask has a first opening with a larger diameter corresponding to the main alignment mark region, and a second opening with a smaller diameter corresponding to the corner region. This local variation in opening size compensates for the corner effect, allowing uniform ion distribution across the entire alignment mark region while maintaining high alignment visibility.

Inventive Principle:
Principle #3Local quality

2Device complexity

If a single opening is used in the stencil mask, then the device complexity is reduced, but the ion distribution uniformity deteriorates due to corner effects

Engineering Contradiction:
Improvestencil mask structureVSAvoidion distribution uniformity
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The patent applies segmentation by dividing the stencil mask opening into two distinct segments: a first opening with a larger diameter for the main alignment mark region, and a second opening with a smaller diameter for the corner region. This segmentation allows each opening to be optimized for its specific function, achieving uniform ion distribution without requiring complex additional structures or multiple masking steps.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enhances the uniformity of ion distribution in the ion-implanted layer, improving measurement reproducibility and alignment accuracy by creating visible alignment marks, thus facilitating precise positioning of the template.

Implementation Method 1

a separate material different in optical properties from the resist is embedded into alignment mark regions of the template. As a method for embedding the separate material, ions are implanted in the template via a stencil mask.

Methodology Applied
Scientific EffectIon implantation: Ion Implantation

Data Source

PatentUS10022748B2Stencil mask, stencil mask manufacturing method, and imprinting method
Publication Date: 2018.07.17 KIOXIA CORP
  • US10022748B2 patent drawing
  • US10022748B2 patent drawing
  • US10022748B2 patent drawing

AI summary

According to one embodiment, a stencil mask includes a first opening and a second opening, the first opening is provided corresponding to a mark region in a template, the second opening is provided adjacent to the first opening, and the diameter of a circle circumscribing the second opening is smaller than the diameter of a circle circumscribing the first opening.