Stepped Substrate Metasurface for Planar Mass Production
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Solution Overview
Problem
Existing metasurfaces with stepped substrates require complex processing technologies for curved surfaces, making them unsuitable for mass production due to the complexity of processing curved surfaces compared to flat surfaces.
Innovation Solution
A metasurface with a stepped substrate is designed and processed using planar semiconductor technology, featuring nanostructures arranged at positions with different substrate heights to modulate light phases, allowing for simpler processing and achieving similar functions to curved substrates while being thinner and more suitable for mass production.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a curved substrate is used to manufacture a metasurface with stepped substrate, then the phase modulation function is achieved, but the processing complexity increases and mass production becomes difficult
Solution Approach 1:
The curved substrate is segmented into multiple discrete stepped levels, transforming a continuous curvature into discrete planar steps. This segmentation allows the metasurface to achieve phase modulation through discrete height levels while maintaining compatibility with planar semiconductor manufacturing processes, thereby reducing processing complexity while preserving the required optical function
Solution Approach 2:
The invention transitions from a two-dimensional curved surface to a three-dimensional stepped structure with discrete height levels. By introducing the vertical dimension as discrete steps rather than continuous curvature, the design achieves phase modulation capability while enabling fabrication using standard planar semiconductor processes, thus resolving the contradiction between functional requirement and manufacturing simplicity
2Manufacturing precision
If a curved substrate is used for metasurface manufacturing, then optical phase modulation is achieved, but mass production suitability deteriorates
Solution Approach 1:
The continuous curved substrate is divided into discrete stepped levels that can be fabricated using standard semiconductor manufacturing techniques. This segmentation enables the metasurface to be produced using existing planar processing tools and methodologies, significantly improving mass production suitability while maintaining the necessary optical phase modulation functionality through the discrete height variations
Solution Approach 2:
The invention changes the geometric parameter of the substrate from continuous curvature to discrete stepped heights. This parameter transformation allows the metasurface to achieve the required optical phase modulation through discrete height levels rather than continuous curvature, thereby enabling compatibility with high-volume semiconductor manufacturing processes and improving mass production capability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The metasurface with a stepped substrate can be processed using existing semiconductor planar processing technology, simplifying production and enabling wider application scenarios while maintaining functionality similar to curved substrates, thus facilitating mass production.
Implementation Method 1
The stepped substrate includes a plurality of positions for phase design that are configured to modulate a phase of incident light
Implementation Method 2
substrate heights of two adjacent positions for phase design are different; substrate heights of respective positions for phase design are related to functions of the metasurface
Data Source
AI summary
Provided are a metasurface having a stepped substrate, methods of designing and processing the metasurface, and an optical lens. The metasurface includes the stepped substrate and nanostructures. The stepped substrate includes a plurality of positions for phase design that are configured to modulate a phase of incident light, and substrate heights of two adjacent positions for phase design are different; substrate heights of respective positions for phase design are related to functions of the metasurface. The nanostructures are respectively arranged at the respective positions for phase design.