Stitched Pattern Image for Wide Field of View DOE Characterization
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Solution Overview
Problem
Conventional characterization systems are inadequate for evaluating optical elements that generate structured light patterns over wide fields of view, as they fail to accurately measure optical aberrations such as non-uniform brightness and distortion across the entire pattern, especially when the field of view exceeds the camera's capabilities.
Innovation Solution
An optical characterization system comprising a camera assembly and a workstation that captures images of a structured light pattern, stitches them together to form a pattern image, and analyzes performance metrics like uniformity and aberrations, allowing for the evaluation of diffractive optical elements with wide fields of view, even when the camera's field of view is smaller.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If a camera assembly with wide field of view is used to capture the entire structured light pattern, then the field of view coverage is improved, but optical aberrations and measurement precision deteriorate
Solution Approach 1:
The patent divides the wide field of view structured light pattern into multiple smaller fields of view, capturing separate images of different portions with a standard camera assembly. This segmentation allows each captured image to maintain high measurement precision while collectively covering the entire wide field of view pattern through subsequent stitching operations.
2Measurement precision
If a camera assembly with narrow field of view is used, then measurement precision is improved, but field of view coverage deteriorates
Solution Approach 1:
The patent merges multiple captured images of different portions into a single stitched pattern image that covers the entire wide field of view. This combining process allows the system to use a standard camera assembly with narrow field of view while still achieving comprehensive coverage of the structured light pattern through computational stitching.
3Device complexity
If conventional optical characterization systems are used, then device complexity is reduced, but adaptability to wide field of view patterns deteriorates
Solution Approach 1:
The patent creates a computational model (pattern image) that replicates the entire wide field of view structured light pattern by stitching together multiple captured images. This copying approach allows conventional camera assemblies to characterize wide field of view diffractive optical elements without requiring specialized wide-angle optics, maintaining system simplicity while achieving adaptability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise characterization of diffractive optical elements by creating a single image of the entire structured light pattern, reducing design constraints for the camera system and effectively measuring optical aberrations across the entire field of view, thereby improving the accuracy of optical element performance evaluation.
Implementation Method 1
The present disclosure generally relates to characterization of optical elements, and specifically, to characterizing wide field of view diffractive optical elements
Implementation Method 2
The workstation uses images captured by the camera assembly to create a pattern image. In some embodiments, the workstation stitches the captured images together to form the pattern image
Data Source
AI summary
An optical characterization system includes a camera assembly and a workstation. The camera assembly is configured to capture images of different portions of a structured light pattern emitted from a device under test in accordance with imaging instructions. In some embodiments, the device under test may be a diffractive optical element (DOE). The workstation provides the imaging instructions to the camera assembly, and stitch the captured images together to form a pattern image. The pattern image is a single image of the entire structured light pattern. The workstation also characterizes performance of the device under test using the pattern image and a performance metric.