Direct Imaging Stitchless Electronic Patterning

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Solution Overview

Problem

Current direct imaging systems for high-resolution electronic patterning face challenges in accurately configuring direct writing data to avoid stitching errors between adjacent scans, particularly due to inaccuracies and distortions in the surface configuration, leading to incomplete exposure of electrical circuit features.

Innovation Solution

The system configures direct writing data to ensure each object is written within a single scan, with scan seams located between objects rather than over them, and modifies CAD data to account for surface inaccuracies and distortions through optical imaging, allowing for side-by-side arrangement of multiple layers within each scan to prevent stitching issues.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of stationary object

If multiple scans are used to cover the entire surface, then the coverage area is improved, but stitching errors occur between adjacent scans

Engineering Contradiction:
Improvecoverage areaVSAvoidstitching accuracy
Core Design Contradiction:
Area of stationary objectVSManufacturing precision

Solution Approach 1:

The system performs optical imaging of the surface before direct writing to detect inaccuracies and distortions in advance. This preliminary measurement allows the system to pre-calculate and pre-position scan seams between objects, preventing stitching errors before they occur during the actual patterning process.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent introduces an intermediary processing step that modifies CAD data by incorporating measured surface distortion information. This intermediary data layer acts as a mediator between the ideal design pattern and the actual physical surface, allowing scan seams to be strategically positioned between objects while compensating for surface irregularities.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If scan seams are positioned between objects, then stitching errors are eliminated, but the scanning complexity increases

Engineering Contradiction:
Improvepattern accuracyVSAvoidscanning configuration complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The system performs self-configuration by automatically detecting surface distortions through optical imaging and autonomously calculating the optimal scan paths and seam positions. This self-service capability eliminates the need for manual scanning configuration, reducing operational complexity despite the sophisticated positioning requirements.

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The patent dynamically changes scanning parameters including scan width, scan speed, and seam positioning based on the measured surface topography. By adapting these parameters to the actual surface conditions, the system achieves high pattern accuracy without requiring complex fixed scanning configurations.

Inventive Principle:
Principle #35Parameter changes

3Measurement precision

If optical imaging is performed to detect surface inaccuracies, then the positioning accuracy is improved, but the process time increases

Engineering Contradiction:
Improvesurface measurement accuracyVSAvoidprocess cycle time
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The system performs optical imaging at a lower resolution or with reduced scanning coverage than would be required for complete surface characterization, focusing only on critical areas that affect pattern placement. This partial measurement approach provides sufficient accuracy for positioning scan seams while significantly reducing the time penalty.

Inventive Principle:
Principle #16Partial or excessive action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach ensures that no object is written across multiple scans, thereby eliminating stitching errors and achieving precise, high-resolution patterning without the need for complex mitigation techniques, enhancing the accuracy and completeness of electronic patterning.

Implementation Method 1

The system creates electrical circuit features on a substrate by exposing photoresist on a surface of the substrate to a laser beam

Methodology Applied
Scientific EffectPhotoresist exposure: Photopolymerisation

Data Source

PatentEP3371639B1Stitchless direct imaging for high resolution electronic patterning
Publication Date: 2022.09.28 ORBOTECH LTD
  • EP3371639B1 patent drawingFigure 1A
  • EP3371639B1 patent drawingFigure 1B
  • EP3371639B1 patent drawingFigure 2A

AI summary

A method of manufacture of objects including receiving a CAD file containing electrical circuit design data for direct writing on a surface, the CAD file including CAD data for a multiplicity of objects to be produced on the surface, automatically configuring a direct write machine to direct write direct writing data based on the CAD data on the surface in plural scans, each having a scan width less than a width of the surface, including arranging the direct writing data for the multiplicity of objects to be written in a side by side manner in each of the plural scans so as to be within the scan width, whereby stitching of direct writing data between adjacent scans is obviated and operating the direct write machine to create the multiplicity of objects on the surface.