Stoker Pod Fixator Structure for Compact EUV Reticle Protection
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Solution Overview
Problem
Conventional storage systems for EUV reticles in photolithography processes are inefficient due to high space requirements, contamination risks, and fragility, particularly during events like earthquakes, and they require frequent replacement, leading to reduced process efficiency and increased costs.
Innovation Solution
A stocker pod system with integrally formed fixators that immobilize its components, reducing contamination and mechanical damage by allowing a gap for purge gas flow and using metallic materials to prevent chemical contamination, while maintaining protection during external events.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If conventional double pod systems are used for storing EUV reticles, then contamination protection is provided, but space requirements increase and mechanical protection during external events deteriorates
Solution Approach 1:
The storage system is divided into multiple compartments within a single pod structure, allowing multiple reticles to be stored separately. Each compartment provides individual contamination protection while the overall pod structure maintains a compact footprint, resolving the contradiction between protection and space efficiency.
Solution Approach 2:
The patent employs a nested structure where inner pods containing reticles are placed within an outer pod. This nested arrangement provides multiple layers of contamination protection while maintaining a compact external dimensions, effectively reducing the space requirements compared to using separate pods for each reticle.
2Ease of manufacture
If polymeric material is used for EOP construction, then ease of manufacture is improved, but chemical contamination increases due to outgassing
Solution Approach 1:
The patent removes the polymeric EOP component from the system entirely, extracting the source of chemical contamination. The inner pod materials are selected to be chemically inert and non-outgassing, eliminating the harmful chemical effects while maintaining the protective enclosure function through alternative material selection.
Solution Approach 2:
The patent employs composite material construction for the inner pod, combining materials that provide both structural integrity and chemical inertness. This approach maintains ease of manufacture through modular assembly while eliminating chemical contamination risks associated with polymeric materials.
3Reliability
If reticle immobilization means are added to EIP, then mechanical protection is improved, but device complexity increases
Solution Approach 1:
The patent combines the immobilization function with the structural elements of the pod itself. The reticle holder is integrated into the pod wall structure, and immobilization features are incorporated into the closure mechanism, eliminating separate complex immobilization devices while maintaining mechanical protection.
Solution Approach 2:
The pod structure provides self-immobilization through its geometric design and closure mechanism. The reticle is automatically positioned and secured when the pod is closed, eliminating the need for additional active immobilization systems and reducing overall device complexity.
4Object-generated harmful factors
If EOP is designed to immobilize EIP components, then friction-induced abrasion is reduced, but the system becomes more fragile during external events
Solution Approach 1:
The patent incorporates cushioning elements and shock-absorbing structures within the pod design that activate during external events. These pre-installed protective features absorb impact forces and prevent the transmission of damaging forces to the reticle, maintaining mechanical strength without relying on friction-based immobilization.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The stocker pod system reduces space requirements, minimizes contamination, enhances mechanical protection, and prevents chemical contamination, ensuring efficient and reliable storage of EUV reticles without the need for frequent replacement, thus improving the overall efficiency of the photolithographic process.
Implementation Method 1
friction (which leads to abrasion and thus particle generation) of the reticle against the container as well as friction of container components relative to one another needs to be avoided
Implementation Method 2
They are also equipped with additional reticle immobilization means to immobilize the reticle inside the EIP. In order to prevent contamination, the EIP is designed to enable a protective gas or vacuum to be applied to the reticle
Data Source
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AI summary
Stocker pod (100) for storing a semiconductor fabrication article, the stocker pod (100) comprising at least two components (110, 120) with at least one fixator (130), integrally formed with at least one of the at least two components (110) of the stocker pod (100), the fixator (130) being configured to immobilize the two or more components (110, 120) of the stocker pod (100) relative to one another.