Depth Sensor Storage Gate Structure for Small Pixels and Low PLS

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Solution Overview

Problem

Existing depth sensors face challenges in increasing resolution while maintaining a reduced pixel size and minimizing parasitic light sensitivity (PLS).

Innovation Solution

A depth sensor design with a substrate structure that includes a photoelectric conversion element and taps, featuring storage transistors with extensions and barrier areas to reduce pixel size and enhance charge storage capacity, thereby reducing PLS.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If the pixel size is decreased to increase resolution, then the resolution is improved, but the charge storage capacity is reduced

Engineering Contradiction:
ImproveresolutionVSAvoidcharge storage capacity
Core Design Contradiction:
Measurement precisionVSQuantity of substance

Solution Approach 1:

The storage gate electrode extends in the depth direction (third direction) of the substrate, utilizing the vertical dimension to increase storage volume without expanding the pixel's planar footprint. This allows charge storage capacity to increase while maintaining small pixel size for high resolution.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The storage gate electrode is embedded within the substrate structure, with its extension nested between the first and second faces of the substrate. This nested configuration maximizes space utilization within the pixel volume, enabling increased charge storage without increasing pixel area.

Inventive Principle:
Principle #7Nested doll (Nesting)

2Measurement precision

If the pixel size is decreased to increase resolution, then the resolution is improved, but the parasitic light sensitivity increases

Engineering Contradiction:
ImproveresolutionVSAvoidparasitic light sensitivity
Core Design Contradiction:
Measurement precisionVSObject-affected harmful factors

Solution Approach 1:

The barrier area is positioned to overlap the storage transistor in the depth direction, creating a three-dimensional shielding structure. This vertical barrier effectively blocks parasitic light from reaching the storage transistor without increasing the pixel's planar dimensions, thus maintaining high resolution while reducing PLS.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The barrier area acts as an intermediary structure between the photoelectric conversion element and the storage transistor, blocking parasitic light paths while allowing the pixel to maintain its compact size for high resolution imaging.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Quantity of substance

If the charge storage capacity is increased, then the charge storage capacity is improved, but the pixel size increases

Engineering Contradiction:
Improvecharge storage capacityVSAvoidpixel size
Core Design Contradiction:
Quantity of substanceVSArea of moving object

Solution Approach 1:

The storage gate electrode utilizes the depth direction (third direction) of the substrate to increase charge storage capacity. By extending vertically between the first and second faces, the storage volume increases without expanding the pixel's area in the first and second directions, thus maintaining small pixel size for high resolution.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The design achieves improved resolution and reduced PLS, enhancing the performance of depth sensors by increasing charge storage capacity and minimizing external light interference.

Implementation Method 1

a photoelectric conversion element disposed in the substrate

Methodology Applied
Scientific EffectPhotoelectric conversion: Photoelectric Effect

Data Source

PatentUS12604546B2Depth sensor
Publication Date: 2026.04.14 SAMSUNG ELECTRONICS CO LTD
  • US12604546B2 patent drawing
  • US12604546B2 patent drawing
  • US12604546B2 patent drawing

AI summary

A depth sensor includes a substrate that includes a first face and a second face opposite to each other in a first direction; a photoelectric conversion element disposed in the substrate; and first and second taps connected to the photoelectric conversion element. Each of the first and second taps includes: a floating diffusion area disposed in the substrate; a transfer transistor connected to the floating diffusion area; a photo transistor connected to the photoelectric conversion element; a tap transfer transistor connected to the photo transistor; and a storage transistor connected to the tap transfer transistor and the transfer transistor. The storage transistor includes a storage gate electrode. The storage gate electrode includes a first extension and a second extension that extend from the first face of the substrate toward the second face, and the first extension and the second extension are spaced apart from each other in a second direction.