Pressure Sensor Film Layout for Strain-Resistant Temperature Detection

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Solution Overview

Problem

Conventional pressure sensors suffer from inaccurate temperature detection due to the resistive film pattern on the outer base surface being affected by strain, which impairs the sensor's accuracy.

Innovation Solution

The pressure sensor incorporates a first resistive film pattern in an outer region and a second resistive film pattern in an inner region, with the first pattern comprising circumferentially oriented portions connected with turns, minimizing the influence of strain on resistance and enabling accurate temperature detection.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If a resistive film pattern is provided on the outer base surface of the stem, then temperature detection is enabled, but the resistance is affected by strain from the outer region, impairing detection accuracy

Engineering Contradiction:
Improvetemperature detection accuracyVSAvoidstrain influence on resistance
Core Design Contradiction:
Measurement precisionVSObject-affected harmful factors

Solution Approach 1:

The outer base surface is divided into an outer region (overlying the side wall) and an inner region (not overlying the side wall). The first resistive film pattern is placed in the outer region while the second resistive film pattern is placed in the inner region, separating the temperature detection function from the strain-affected area.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different regions of the outer base surface are assigned different functions: the inner region is used for temperature detection (second resistive film pattern) where strain influence is minimal, while the outer region contains the first resistive film pattern with circumferentially oriented portions that are less sensitive to radial strain.

Inventive Principle:
Principle #3Local quality

2Measurement precision

If a temperature-detecting resistive film is added to eliminate temperature influence from pressure output, then pressure measurement accuracy is improved, but the device complexity increases

Engineering Contradiction:
Improvepressure measurement accuracyVSAvoidresistive film pattern complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The first resistive film pattern (for temperature detection) and the second resistive film pattern (for pressure detection) are merged into a single integrated resistive film structure on the outer base surface, sharing common elements and reducing overall device complexity despite the dual-function requirement.

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The design allows for highly accurate temperature detection and pressure measurement across a wide temperature range by mitigating strain-induced resistance changes in the resistive film pattern, ensuring precise readings.

Implementation Method 1

resistance of the pressure-detecting resistive film is affected by temperature

Methodology Applied
Scientific EffectThermal expansion: Thermal Expansion

Implementation Method 2

resistance of the pressure-detecting resistive film is affected by temperature

Methodology Applied
Scientific EffectPiezoresistive effect: Piezoresistive Effect

Data Source

PatentUS20250297907A1Pressure sensor
Publication Date: 2025.09.25 TDK CORP
  • US20250297907A1 patent drawing
  • US20250297907A1 patent drawing
  • US20250297907A1 patent drawing

AI summary

A pressure sensor includes a stem including a base wall and a side wall extending in a first direction crossing the base wall; a first resistive film pattern provided in an outer region of an outer base surface of the base wall, the outer region overlying the side wall in plan view from the first direction; and a second resistive film pattern provided at least partly in an inner region of the outer base surface, the inner region not overlying the side wall in plan view from the first direction. The first resistive film pattern includes circumferentially oriented pattern portions connected with a turn, the circumferentially oriented pattern portions extending along a circumferential direction and having different distances from a center of the outer base surface.