Strip Oxide Semiconductor Overlap for Low-Capacitance Displays
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Solution Overview
Problem
In transmissive liquid crystal display devices, particularly those used in smartphones and tablets, the increase in resolution leads to a demand for smaller, high-current switching elements. However, connecting the gate electrode of the switching element to a light-shielding layer as a back gate electrode increases parasitic capacitance, degrading display quality.
Innovation Solution
The display device incorporates an oxide semiconductor layer that crosses the gate line between the source lines and is connected to the second source line. The oxide semiconductor layer has a first overlapping portion that overlaps an opening in the light-shielding layer, reducing parasitic capacitance without compromising the aperture ratio.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If the gate electrode is electrically connected to the light-shielding layer to pass a large amount of current, then the current passing capability is improved, but parasitic capacitance increases
Solution Approach 1:
The semiconductor layer is divided into multiple regions with different functions: a first region that overlaps the gate electrode for current conduction, and a second region that overlaps the light-shielding layer for capacitance reduction. This segmentation allows each region to optimize its local function, resolving the contradiction between current passing capability and parasitic capacitance.
Solution Approach 2:
Different portions of the semiconductor layer are assigned different properties: the first region is positioned to maximize electrical contact with the gate electrode for high current conduction, while the second region is positioned to minimize overlap with the light-shielding layer, reducing parasitic capacitance. This local differentiation resolves the contradiction by optimizing each area for its specific function.
2Measurement precision
If the switching element size is reduced to increase resolution, then the resolution is improved, but the current passing capability deteriorates
Solution Approach 1:
The semiconductor layer extends in multiple dimensions with different functional regions. By utilizing the planar dimension to create overlapping portions with both the gate electrode and light-shielding layer, the design achieves high current conduction in a compact area, enabling small pixel sizes with sufficient current capability for high-resolution displays.
Data Source
AI summary
According to one embodiment, a display device includes a gate line extending in a first direction, first and second source lines crossing the gate line and arranged in the first direction, a first light-shielding layer having first and second openings, and an oxide semiconductor layer crossing the gate line, and in the display device, the first opening and the second opening are arranged in a second direction crossing the first direction between the first source line and the second source line, the gate line is located between the first opening and the second opening, and the oxide semiconductor layer has a first overlapping portion overlapping the first opening.


