Structured Coating via Plasma-Enhanced Thermal Electron Beam Evaporation
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Solution Overview
Problem
Existing methods for producing structured coatings on substrates are limited in terms of efficiency and adaptability, particularly in achieving high optical transmission, scratch resistance, and handling temperature-sensitive materials, with evaporation glass materials having limitations in melting temperature and substrate preheating requirements.
Innovation Solution
The method involves depositing aluminium oxide, silicon dioxide, silicon nitride, or titanium dioxide using plasma-enhanced thermal electron beam evaporation, allowing for individually designed coatings with improved layer properties, such as higher optical transmission and scratch resistance, without the need for intense substrate preheating, and enabling the production of multi-layered coatings with controlled adhesion and stress.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If evaporation glass material is used for depositing structured coating, then the coating can be produced by thermal evaporation, but the optical transmission is lower and scratch resistance is reduced compared to single-component systems
Solution Approach 1:
The patent changes the material composition parameter from evaporation glass to single-component systems (silicon dioxide, aluminium oxide, titanium dioxide, silicon nitride), which fundamentally improves scratch resistance and optical transmission properties while maintaining compatibility with thermal evaporation processes
Solution Approach 2:
The patent employs multi-layer composite structures combining different single-component materials (e.g., silicon dioxide with aluminium oxide, or titanium dioxide with silicon nitride) to achieve synergistic effects that enhance both mechanical strength and optical properties while remaining manufacturable through sequential deposition
2Productivity
If intense substrate preheating is applied to enable thermal evaporation, then coating deposition is facilitated, but temperature-sensitive materials are damaged and processing time increases
Solution Approach 1:
The patent replaces the conventional thermal field-based heating system with a plasma-enhanced field system. Plasma activation provides the necessary energy for coating deposition without requiring intense substrate preheating, thereby protecting temperature-sensitive materials while maintaining deposition efficiency
Solution Approach 2:
The patent introduces plasma as an additional energy parameter that enables coating deposition at lower substrate temperatures. The plasma provides reactive species and activation energy, replacing the need for high thermal energy input and enabling efficient deposition on temperature-sensitive substrates
3Strength
If single-component evaporation materials (silicon dioxide, aluminium oxide, titanium dioxide, silicon nitride) are used, then optical transmission and scratch resistance are improved, but the melting temperatures are significantly higher requiring more energy
Solution Approach 1:
The patent replaces conventional thermal evaporation with plasma-enhanced thermal electron beam evaporation. The electron beam provides highly localized and efficient energy coupling to the coating material, reducing overall energy consumption while enabling the deposition of high-melting-point single-component materials with superior optical and mechanical properties
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the production of high-quality, efficient structured coatings with improved optical and mechanical properties, suitable for various applications, including temperature-sensitive materials, with reduced processing time and minimized defects, while avoiding excessive substrate temperatures.
Implementation Method 1
depositing at least one evaporation coating material, namely aluminium oxide, silicon dioxide, silicon nitride or titanium dioxide, by means of thermal evaporation of the at least one evaporation coating material
Implementation Method 2
The structured coating is completely or only partly produced by means of plasma-enhanced thermal electron beam evaporation
Data Source
AI summary
The invention relates to a method for producing a structured coating on a substrate, wherein the method comprises the following steps: providing a substrate having a surface to be coated and producing a structured coating on the surface of the substrate to be coated by depositing at least one evaporation coating material, namely aluminium oxide, silicon dioxide, silicon nitride, or titanium dioxide, on the surface of the substrate to be coated by means of thermal evaporation of the at least one evaporation coating material and using additive structuring. The invention further relates to a coated substrate and a semi-finished product having a coated substrate.