Structured-Light Projector Pattern Mask with Oblique Reflection

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Solution Overview

Problem

Existing structured-light systems face challenges in achieving high light utilization efficiency and resolution, particularly in miniaturization and integration with electronic apparatuses, due to limitations in optical component design and fabrication precision.

Innovation Solution

A structured-light projector is designed with a pattern mask featuring a light-transmitting slit and obliquely reflecting patterns, where the reflective surface is inclined to enhance light transmission, and a meta-lens with nano-sized columns is used to improve light focusing, along with a transparent high-refractive-index layer and lens distortion compensation regions to optimize light distribution.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of energy

If a conventional pattern mask with absorbing patterns is used, then the structured light pattern is formed, but the light utilization efficiency is low due to light absorption losses

Engineering Contradiction:
Improvelight utilization efficiencyVSAvoidoptical component design complexity
Core Design Contradiction:
Loss of energyVSDevice complexity

Solution Approach 1:

The patent converts the harmful effect of light absorption into a beneficial reflective effect by replacing absorbing patterns with reflective patterns on the pattern mask. The reflective patterns obliquely reflect illumination light toward the light-transmitting slit, transforming what would be lost light into useful structured light that contributes to the projection pattern, thereby significantly improving light utilization efficiency.

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

Solution Approach 2:

The patent changes the optical parameters of the pattern mask by introducing reflective surfaces with specific inclination angles (5-15 degrees) and aspect ratios (height to width ratio of 5 to 15). These parameter changes optimize the reflection direction and light concentration, enabling efficient light redirection toward the transmitting slit while maintaining pattern formation capability.

Inventive Principle:
Principle #35Parameter changes

2Volume of moving object

If the projector is miniaturized for integration with electronic apparatuses, then the device size is reduced, but the resolution and optical performance may deteriorate

Engineering Contradiction:
Improveprojector sizeVSAvoidthree-dimensional shape recognition accuracy
Core Design Contradiction:
Volume of moving objectVSMeasurement precision

Solution Approach 1:

The patent applies local quality optimization by designing specific geometric features at critical locations: the reflective patterns have optimized aspect ratios (5 to 15) and inclination angles (5-15 degrees), the transmitting slit has specific width ratios (0.5-2 times the pattern width), and the meta-lens has precisely controlled nano-column dimensions. These localized optimizations ensure high optical performance despite the overall miniaturized projector size.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent transitions from conventional 2D pattern masks to a 3D structured design with reflective patterns having specific height, width, and inclination angle dimensions. The meta-lens further introduces nanoscale vertical structures (columns with heights 10-100 times their diameter). These dimensional additions enable enhanced light control and focusing in a compact footprint, maintaining high resolution while reducing overall device volume.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Illumination intensity

If the light transmission angle is increased to improve light distribution, then the brightness uniformity improves, but the light concentration at the focal point decreases

Engineering Contradiction:
Improvebrightness uniformityVSAvoidlight focusing precision
Core Design Contradiction:
Illumination intensityVSManufacturing precision

Solution Approach 1:

The patent employs dynamic optimization of the reflective pattern geometry, where the inclination angle (5-15 degrees) and aspect ratio (5 to 15) are specifically tuned to balance two competing requirements: redirecting light at angles that improve brightness uniformity across the projection area while maintaining sufficient light concentration. The meta-lens parameters (column diameter 1-10 micrometers, height 10-100 times diameter) are similarly optimized to dynamically balance spreading and focusing effects.

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration significantly improves light utilization efficiency and brightness of structured light, reducing power consumption and enhancing the accuracy of three-dimensional shape recognition and motion detection in electronic apparatuses.

Implementation Method 1

a plurality of reflection patterns configured to obliquely reflect the illumination light toward the light-transmitting slit

Methodology Applied
Scientific EffectReflection: Reflection

Implementation Method 2

a meta-lens with nano-sized columns is used to improve light focusing

Methodology Applied
Scientific EffectFocusing: Focusing

Data Source

PatentUS10866086B2Structured-light projector and electronic apparatus including structured-light projector
Publication Date: 2020.12.15 SAMSUNG ELECTRONICS CO LTD
  • US10866086B2 patent drawing
  • US10866086B2 patent drawing
  • US10866086B2 patent drawing

AI summary

A structured-light projector includes an illuminating device configured to emit illumination light, a pattern mask configured to partially transmit the illumination light to generate structured light, and a lens configured to transmit the structured light, wherein the pattern mask includes a light-transmitting slit configured to transmit the illumination light, and a plurality of reflection patterns configured to obliquely reflect the illumination light toward the light-transmitting slit.