Structured Light Projector Pattern Mask Brightness Uniformity

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Solution Overview

Problem

Structured light projectors face challenges in achieving uniform brightness due to lens distortion and illumination non-uniformity, which affect the precision of 3D image recognition and motion detection in electronic apparatuses.

Innovation Solution

A structured light projector design incorporating a pattern mask with concentric lens distortion compensation regions and illumination non-uniformity compensation regions, featuring varying opaque light shielding patterns and light transmitting slits, which adjust optical transmittance to compensate for brightness variations caused by lens distortion and illumination non-uniformity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a conventional pattern mask is used without distortion compensation, then the device complexity is low, but the brightness uniformity of structured light deteriorates

Engineering Contradiction:
Improvebrightness uniformityVSAvoidpattern mask complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The pattern mask is divided into multiple regions (central region, intermediate region, outer region) with different transmittance characteristics. Each region has specifically designed slit patterns that differ from other regions, allowing local optimization of brightness distribution to compensate for lens distortion effects.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The pattern mask is segmented into multiple functional regions with distinct slit configurations. The central region, intermediate region, and outer region each have different slit widths, spacing, and orientations to address specific brightness uniformity issues in different areas of the projected structured light.

Inventive Principle:
Principle #1Segmentation

2Illumination intensity

If the slit width in the pattern mask is increased to improve brightness, then the illumination intensity increases, but the resolution of structured light patterns deteriorates

Engineering Contradiction:
ImprovebrightnessVSAvoidpattern resolution
Core Design Contradiction:
Illumination intensityVSManufacturing precision

Solution Approach 1:

Different regions of the pattern mask have different slit widths optimized for their specific functions. The central region uses narrower slits for higher resolution, while outer regions use wider slits to compensate for lower illumination intensity, achieving overall brightness uniformity without sacrificing pattern resolution.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution ensures uniform brightness of structured light projection, enhancing the precision of 3D sensing and motion detection in electronic apparatuses by compensating for distortions and non-uniformities, thereby improving the accuracy of 3D image recognition.

Implementation Method 1

a pattern mask configured to generate structured light by partially transmitting the illumination light

Methodology Applied
Scientific EffectLight transmission and optical transmittance: Light

Implementation Method 2

a lens configured to transmit the structured light

Methodology Applied
Scientific EffectLens distortion and light focusing: Lens

Data Source

PatentUS11976918B2Structured light projector and electronic apparatus including the same
Publication Date: 2024.05.07 SAMSUNG ELECTRONICS CO LTD
  • US11976918B2 patent drawing
  • US11976918B2 patent drawing
  • US11976918B2 patent drawing

AI summary

A structured light projectors includes an illuminator configured to emit illumination light, a pattern mask configured to project structured light by partially transmitting the illumination light, and a lens configured to project the structured light, wherein the pattern mask includes a first lens distortion compensation region including a plurality of opaque first light shielding patterns having a first pattern width, respectively, and a second lens distortion compensation region surrounding the first lens distortion compensation region, the second lens distortion compensation region including a plurality of opaque second light shielding patterns having a second pattern width, respectively, wherein the second pattern width is less than the first pattern width.