Sublimating Coating Film Cleaning for Metal Pattern Integrity
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In substrate processing, the removal of rinse liquid between metal patterns can lead to drying failures due to surface tension, causing metal pattern collapse, and the sublimation of topcoat films can result in contamination from particles attached to the front surface.
Innovation Solution
A substrate processing method involving the formation of a sublimating coating film on the substrate's surface, which is then cleaned without using liquids, and a substrate processing apparatus that includes a coating film cleaning unit to remove contaminants from the coating film's front surface, ensuring the coating film is removed and contaminants are suppressed.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If rinse liquid is used to clean the substrate, then the substrate surface is cleaned, but the rinse liquid enters between metal patterns causing drying failure and metal pattern collapse due to surface tension
Solution Approach 1:
The invention extracts and removes the harmful rinse liquid from between metal patterns using a suction device before the spin drying step. By actively removing the liquid that would otherwise cause surface tension problems during drying, the method prevents metal pattern collapse while maintaining cleaning effectiveness.
Solution Approach 2:
The invention performs preliminary removal of rinse liquid from between metal patterns before the spin drying step. This preliminary action eliminates the source of surface tension problems that would occur during subsequent drying, preventing metal pattern collapse in advance.
2Object-affected harmful factors
If topcoat film is removed by sublimation, then metal pattern oxidation is suppressed, but contaminants on the front surface of the topcoat film remain on the substrate
Solution Approach 1:
The invention performs preliminary cleaning of the topcoat film's front surface using a cleaning liquid before the sublimation step. This removes contaminants that would otherwise remain on the substrate after sublimation, ensuring substrate cleanliness while preserving the oxidation-protection benefit of sublimation.
Solution Approach 2:
The invention changes the physical state of the topcoat film from solid to gas through sublimation, allowing the film to be removed without liquid contact that could cause oxidation. This phase change enables contamination-free removal while protecting the metal pattern.
3Manufacturing precision
If topcoat film is removed by liquid, then the film is removed from the substrate, but the metal pattern collapses due to surface tension of the liquid
Solution Approach 1:
The invention uses sublimation, a phase transition from solid to gas, to remove the topcoat film. This eliminates the need for liquid contact with the metal pattern, preventing surface tension-induced collapse while achieving complete film removal.
Solution Approach 2:
The invention replaces the mechanical/chemical action of liquid removal with a thermal phase change process. Instead of using liquid to dissolve or lift the film, heat energy induces sublimation, eliminating mechanical stress and surface tension effects on the metal pattern.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method effectively prevents metal pattern collapse and contamination by removing the coating film without liquids and cleaning the coating film's front surface, improving throughput and maintaining substrate cleanliness.
Implementation Method 1
a coating film forming step of supplying a coating agent to the first major surface to form a sublimating coating film which covers the first major surface
Data Source
AI summary
A substrate processing method includes a substrate holding step of horizontally holding a substrate having a first major surface and a second major surface at an opposite side of the first major surface, a coating film forming step of supplying a coating agent to the first major surface to form a sublimating coating film which covers the first major surface, and a coating film cleaning step of cleaning a front surface of the coating film.