Sublimation Drying Liquid Selection for Pattern Collapse Prevention
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Solution Overview
Problem
Existing substrate drying methods using sublimable substances do not adequately consider the affinity between the solvent and the pattern, leading to high collapse rates of patterns due to residual solvent retention, especially when the solvent has inappropriate affinity with the pattern surface.
Innovation Solution
A method for manufacturing a sublimable substance-containing liquid that selects a sublimable substance and solvent based on the hydrophilicity or hydrophobicity of the pattern surface, minimizing solvent affinity to reduce residual solvent retention and collapsing forces on the pattern.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a solvent with high affinity to the pattern surface is used, then the solvent is likely to be held by the pattern surface, but this causes residual solvent retention and pattern collapse
Solution Approach 1:
The patent changes the affinity parameter between solvent and pattern surface by selecting solvents with low affinity regardless of pattern hydrophilicity/hydrophobicity. This parameter change prevents the solvent from being held by the pattern surface, eliminating residual solvent retention and pattern collapse while maintaining effective drying function.
2Manufacturing precision
If IPA or hydrophobizing agent is supplied to reduce surface tension, then the contact angle is brought closer to 90 degrees, but the collapsing force does not become zero and pattern collapse still occurs
Solution Approach 1:
The patent changes the surface tension parameter by using solvents with inherently low affinity to the pattern surface. Unlike IPA or hydrophobizing agents that only adjust contact angle, this approach fundamentally reduces the collapsing force to near zero while maintaining effective liquid supply and drying function.
3Reliability
If sublimation drying is used to prevent pattern collapse, then the sublimable substance sublimates and is removed, but the solvent affinity issue causes residual solvent to remain between patterns
Solution Approach 1:
The patent changes the affinity parameter between solvent and pattern surface to low affinity. This ensures that the solvent is not held by the pattern surface even when sublimation drying is used, preventing residual solvent retention between patterns and achieving complete pattern protection.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method effectively reduces the collapse rate of patterns by minimizing solvent retention and collapsing forces, ensuring low collapse rates regardless of pattern hydrophilicity or hydrophobicity.
Implementation Method 1
the sublimable substance sublimates and is removed from the substrate
Implementation Method 2
When removing the sublimable substance-containing liquid from the substrate, the solvent is evaporated from the sublimable substance-containing liquid on the front surface of the substrate
Implementation Method 3
a force due to the surface tension of the processing liquid adhering to the substrate applies to the pattern, so that the pattern may collapse
Data Source
AI summary
A sublimable substance is selected on the basis of whether the surface of a pattern is hydrophilic or hydrophobic. In cases where the surface of a pattern is hydrophilic, a solvent for hydrophilic cases is selected, said solvent having lower solubility in water than the selected sublimable substance; and in cases where the surface of a pattern is hydrophobic, a solvent for hydrophobic cases is selected, said solvent having lower solubility in oils than the selected sublimable substance. The selected sublimable substance is dissolved in the selected solvent.