Sublimation Gas Supply System Buffer Tank Vessel Replacement
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Solution Overview
Problem
Conventional sublimation gas supply systems experience a decrease in utilization rate when the solid material vessel is replaced, requiring the discharge of sublimation gas from the storage chamber.
Innovation Solution
A sublimation gas supply system with a vessel, buffer tank, and flow control devices that allow continuous supply of sublimation gas to a subsequent process without discharging the gas from the buffer tank, even when the solid material vessel is replaced, by using a dilution gas to maintain gas flow and pressure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the solid material vessel is replaced in a conventional sublimation gas supply system, then the vessel can be renewed for continued operation, but the sublimation gas in the storage chamber must be discharged resulting in loss of substance
Solution Approach 1:
The system is divided into two independent gas storage paths: a first storage chamber connected to the vessel and a second storage chamber. This segmentation allows the first chamber to be emptied when the vessel is replaced, while the second chamber retains its sublimation gas, thus preventing loss of substance during vessel renewal.
Solution Approach 2:
The system discards (empties) sublimation gas from the first storage chamber when vessel replacement is needed, while recovering and preserving the sublimation gas in the second storage chamber. This selective discarding and recovering approach minimizes overall loss of substance while enabling vessel renewal.
2Reliability
If the solid material vessel is replaced in a conventional sublimation gas supply system, then the vessel can be renewed, but the utilization rate of sublimation gas decreases due to gas discharge
Solution Approach 1:
The dual storage chamber configuration with separate paths allows independent operation of each chamber. When vessel replacement occurs, only the first chamber is affected and can be emptied, while the second chamber continues to supply sublimation gas, thereby maintaining high utilization rate and ensuring continuous productivity.
Solution Approach 2:
The system ensures continuous supply of sublimation gas by having a second storage chamber that remains filled and operational during vessel replacement. This continuity of useful action prevents interruption in gas supply to the film formation chamber, maintaining productivity despite vessel renewal.
3Loss of substance
If a dual storage chamber system is implemented to prevent gas loss during vessel replacement, then loss of substance is reduced, but device complexity increases
Solution Approach 1:
While segmentation into dual storage chambers does increase structural complexity, it efficiently prevents sublimation gas loss during vessel replacement. The segmented design allows independent management of gas supply paths, reducing overall substance loss despite the added complexity.
Solution Approach 2:
The dual storage chamber system with switching capability provides multi-functionality: it can supply sublimation gas continuously, prevent gas loss during vessel replacement, and maintain flexible control over gas flow. This universality justifies the increased device complexity by delivering multiple benefits simultaneously.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration maintains the utilization rate of sublimation gas by allowing seamless transition between solid material vessels without discharging stored gas, enhancing efficiency in film formation processes for semiconductor and liquid crystal panel manufacturing.
Implementation Method 1
a 1st heater that heats said 1st vessel so that said 1st solid material sublimates to produce a 1st sublimation gas
Data Source
AI summary
The provision of a sublimation gas supply system and sublimation gas supply method, where there is no decrease in the utilisation rate of the sublimation gas even when the solid material vessel is replaced. Sublimation gas supply system, having: 1st vessel; 1st heater that heats 1st vessel; 1st buffer tank that stores sublimation gas; dilution gas channel for introducing dilution gas into 2nd channel, that is connected to 1st connector C1 in 2nd channel; 1st flow control device for controlling flow, provided between 1st connector C1 and 1st buffer tank on the 2nd channel; 2nd flow control device for controlling flow, provided on the dilution gas channel; and mixing vessel, provided on the 2nd channel, for mixing the 1st sublimation gas and dilution gas brought together by means of 1st connector C1.