Sub-Pixel Layout and Repair Bridge Lines for High-Aperture Displays
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Solution Overview
Problem
Existing display devices face challenges in maintaining a high aperture ratio during repair processes, which can compromise the stability and efficiency of the display.
Innovation Solution
The display device incorporates a repair bridge line formed in a different layer from the gate line, allowing for a bypass line to transmit gate signals during repairs, and adjusts the structure of sub-pixels to optimize the aperture ratio, reducing data line bending and increasing the open area.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a repair area is introduced for stable repair processes, then repair stability is improved, but the aperture ratio decreases due to additional structure occupation
Solution Approach 1:
The patent introduces a repair bridge line formed in a different layer (ELV layer) from the gate line, utilizing the vertical dimension to resolve the conflict. This allows the repair functionality to be added without occupying additional horizontal space in the emission area, thereby maintaining the aperture ratio while enabling stable repair processes.
Solution Approach 2:
The patent segments the gate line functionality by introducing a separate repair bridge line that operates independently in a different layer. This segmentation allows the repair function to be isolated from the main gate line structure, enabling repair operations without interfering with the aperture ratio of the display area.
2Ease of repair
If a bypass line is added to transmit gate signals during repair, then repair capability is improved, but device complexity increases
Solution Approach 1:
The repair bridge line is designed to be formed in the same manufacturing process as the existing ELV (emission layer voltage) line, allowing it to serve multiple functions: normal signal transmission during operation and bypass functionality during repair. This multi-functionality reduces the need for entirely separate repair infrastructure, thereby limiting the increase in device complexity.
Solution Approach 2:
The patent merges the repair bridge line with the existing ELV line structure, forming them in the same layer and using similar materials. This merging approach allows the repair functionality to be integrated into the existing device architecture rather than adding completely separate components, thus minimizing the increase in device complexity.
3Area of moving object
If sub-pixel structure is inverted to optimize aperture ratio, then aperture ratio is improved, but manufacturing complexity increases
Solution Approach 1:
The patent introduces asymmetry in the sub-pixel structure by inverting the arrangement of certain sub-pixels (e.g., placing the non-emission area at different positions for different sub-pixel types). This asymmetric design optimizes the aperture ratio by better utilizing the available space, while the inversion is implemented through standard photolithography processes to manage manufacturing complexity.
Data Source
AI summary
A display device includes a substrate having a plurality of sub-pixels provided thereon, each of the plurality of pixels including an emission area and a non-emission area, at least one gate line disposed in the non-emission area and extended in one direction, at least one signal line disposed in the non-emission area and crossing the at least one gate line, at least one repair bridge line connected to the at least one signal line. The plurality of sub-pixels includes a red sub-pixel, a white sub-pixel, a green sub-pixel, and a blue sub-pixel, a structure of the green sub-pixel and the blue sub-pixel is inverted with respect to a structure of the red sub-pixel and the white sub-pixel, the at least one repair bridge line is formed in a layer different from a layer of the at least one gate line.