Apparatus and method of processing substrate
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Solution Overview
Problem
Existing substrate processing methods fail to control airflow distribution based on the type of treatment liquid used, leading to inefficiencies in processing due to varying atmospheric requirements for different treatment liquids.
Innovation Solution
A substrate processing apparatus with an airflow distribution unit that can switch between two modes: one for concentrated airflow in the process space and another for uniform airflow in the interior space, allowing for tailored airflow distribution based on the specific treatment liquid being used.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If descending airflow is supplied onto the substrate without a separate distribution means, then the structure is simple, but the flow of the descending airflow cannot be controlled according to the type of treatment liquid
Solution Approach 1:
The airflow distribution unit employs a movable plate that can dynamically change position to alter airflow distribution patterns. The plate moves between different positions to switch between concentrated airflow mode (for process space) and uniform airflow mode (for interior space), enabling adaptability without requiring multiple fixed distribution structures.
Solution Approach 2:
The airflow distribution unit is segmented into a fixing plate with first holes and a moving plate with third holes. The moving plate can be positioned to cover either the first region (with first holes) or the second region (with second holes), allowing selective control of airflow paths. This segmentation enables different airflow modes through a single distributed structure.
2Productivity
If concentrated airflow is provided to the process space, then processing efficiency is improved for certain treatment liquids, but uniform airflow distribution in the interior space cannot be maintained
Solution Approach 1:
The system dynamically switches between two airflow distribution modes by moving the moving plate. When concentrated airflow to the process space is needed for processing efficiency, the plate positions to allow airflow through the first region. When uniform interior space airflow is needed, the plate moves to allow airflow through the second region, maintaining atmospheric stability.
3Manufacturing precision
If different treatment liquids are used with different atmospheric requirements, then processing quality is improved, but the single airflow system cannot meet varying atmospheric needs
Solution Approach 1:
The airflow distribution unit provides dynamic adaptability by switching between concentrated and uniform airflow modes based on the treatment liquid being used. This enables the system to meet different atmospheric requirements for different liquids without requiring separate airflow systems for each liquid type.
Solution Approach 2:
A single airflow distribution unit serves multiple functions by switching between different distribution modes. The same structure can provide concentrated airflow for process space when needed for processing quality, and uniform airflow for interior space when needed for atmospheric control, making the system universal for different treatment liquid requirements.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances processing efficiency by intensively providing airflow to the process space for certain liquids, maintaining low humidity, and effectively exhausting fumes, thereby optimizing the processing environment for different treatment liquids.
Implementation Method 1
a fan for supplying descending airflow into the interior space
Implementation Method 2
an airflow distribution unit that is disposed under the fan and above the treatment container and distributes the descending airflow to the interior space
Implementation Method 3
an exhaust unit for exhausting the process space
Data Source
AI summary
Disclosed are a substrate processing method and a substrate processing apparatus, and more particularly, a substrate processing apparatus which treats a substrate by adjusting airflow supplied to a process space. The apparatus of treating the substrate includes: a housing having an upper wall and providing an interior space; a treatment container provided in the interior space and providing a process space with an open top; a support unit for supporting a substrate within the process space; a liquid supply unit for supplying a treatment liquid on the substrate supported by the support unit; an exhaust unit for exhausting the process space; a fan for supplying descending airflow into the interior space; and an airflow distribution unit that is disposed under the fan and above the treatment container and distributes the descending airflow to the interior space, in which the airflow distribution unit is provided to distribute the descending airflow in a mode selected from a first mode and a second mode, and in the first mode and the second mode, a flow of the descending airflow is provided differently from each other.