Substrate Drying Vessel Barrier for Particle Discharge Control
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Solution Overview
Problem
Conventional substrate processing apparatuses using supercritical fluids for integrated circuit manufacturing often generate and retain contaminants, leading to defects on substrates during the drying process due to particle adsorption.
Innovation Solution
A substrate processing apparatus with a vessel design featuring a movable upper and lower vessel configuration, a substrate support, and a barrier to prevent particle contamination, along with a protective layer to reduce friction-induced particle generation, ensures effective discharge of particles and improved drying productivity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a conventional substrate processing apparatus uses a supercritical fluid for drying, then the drying process can be performed, but contaminants and particles are generated and remain in the vessel, causing defects on substrates
Solution Approach 1:
The invention extracts and removes particles from the processing space by introducing a gas flow that carries particles out through a particle discharge port. The gas introduction unit supplies gas toward the substrate, and particles are discharged through the particle discharge port, effectively separating harmful particles from the processing environment.
Solution Approach 2:
The invention introduces gas as an intermediary medium to transport particles from the processing space to the discharge port. The gas acts as a carrier that mediates the removal of particles without directly contacting the substrate, thus preventing contamination while maintaining drying efficiency.
2Ease of manufacture
If the vessel structure is simplified for ease of manufacture, then manufacturing cost is reduced, but particle discharge efficiency may be compromised
Solution Approach 1:
The vessel structure integrates multiple functions: it serves as both the processing chamber and the particle discharge pathway. The side wall of the vessel incorporates the particle discharge port, and the gas introduction unit is integrated into the vessel structure, allowing a single component to perform both processing and particle removal functions.
Solution Approach 2:
The invention merges the particle discharge function with the vessel structure itself. The particle discharge port is formed in the side wall of the vessel, combining the containment function and the particle removal function into a single integrated structure, simplifying manufacturing while maintaining reliability.
3Reliability
If the barrier extends further downward to improve particle prevention, then particle discharge efficiency is enhanced, but the device complexity increases
Solution Approach 1:
The barrier is positioned to extend downward in advance before particles can reach the substrate. This preliminary positioning prevents particles from contaminating the substrate by blocking their path ahead of time, ensuring particle prevention without requiring complex active control mechanisms.
Solution Approach 2:
The barrier structure is segmented into different height regions, with the lower portion extending further downward to specifically target particle discharge pathways. This segmentation allows the barrier to perform particle prevention functions at critical locations without unnecessarily complicating the entire structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively prevents particle-induced defects on substrates during drying, enhancing the productivity of the substrate drying process by ensuring clean processing environments and efficient particle management.
Implementation Method 1
Methods using a supercritical fluid have been proposed to perform a predetermined process such as etching, cleaning, or drying on a substrate
Data Source
AI summary
A substrate processing apparatus includes a vessel providing a processing space for processing a substrate, a substrate support supporting the substrate loaded in the processing space, and a barrier between a side wall of the vessel and the substrate support and surrounding an edge of the substrate supported by the substrate support.