Multi-Path Fluid Supply for Uniform Substrate Bath Flow
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Solution Overview
Problem
Conventional substrate processing apparatuses face challenges in generating uniform liquid flow within the processing tub, leading to biased liquid flow distribution among substrates due to inconsistent gas supply, resulting in uneven processing outcomes.
Innovation Solution
The apparatus incorporates a fluid supply system with multiple discharge paths that can individually control the flow rate and timing of gas discharge to different regions, ensuring uniform liquid flow generation by optimizing the placement and adjustment of discharge paths based on substrate arrangement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If a gas supply is provided within the processing tub to generate liquid flow, then liquid flow is generated within the processing tub, but uniform liquid flow distribution among substrates is difficult to achieve
Solution Approach 1:
The gas supply system is divided into multiple discharge paths (first discharge path and second discharge path) that discharge gas to different regions in the arrangement direction of substrates. Each discharge path can be controlled independently to achieve uniform liquid flow distribution across all substrates, resolving the contradiction between generating sufficient liquid flow and maintaining uniformity.
Solution Approach 2:
Different regions in the arrangement direction of substrates are provided with different discharge paths that can be controlled independently. This allows local adjustment of gas discharge to each region, ensuring that liquid flow is uniformly distributed across all substrates while maintaining overall liquid flow generation.
2Quantity of substance
If gas is supplied uniformly to all regions, then liquid flow is generated, but biased liquid flow distribution occurs among substrates
Solution Approach 1:
The gas supply is segmented into multiple discharge paths positioned at different locations in the arrangement direction of substrates. Each discharge path can be controlled independently, allowing the system to generate liquid flow while avoiding biased distribution by adjusting each region's gas supply individually.
Solution Approach 2:
The gas discharge control is made dynamic by enabling independent adjustment of each discharge path. This allows the system to adaptively control liquid flow distribution to achieve uniformity across substrates, transforming a static uniform supply into a dynamically adjustable multi-region supply system.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for a more uniform and appropriate liquid flow within the processing tub, enhancing the consistency of substrate processing and reducing biases in etching and other processing operations.
Implementation Method 1
a gas supply configured to supply a gas such as a nitrogen gas may be provided within the processing tub to generate a liquid flow within the processing tub
Data Source
AI summary
A substrate processing apparatus comprises a processing tub and a fluid supply. In the processing tub, a processing is performed on multiple substrates by immersing the multiple substrates in a processing liquid. The fluid supply is disposed under the multiple substrates within the processing tub and configured to discharge a fluid to generate a liquid flow of the processing liquid within the processing tub. Further, the fluid supply includes multiple discharge paths configured to discharge the fluid to different regions in an arrangement direction of the multiple substrates.