Substrate Processing Bath Nozzle Segmentation for Contaminant Removal

Solution Overview

Problem

Conventional substrate processing apparatuses face challenges in achieving uniform processing and efficient liquid replacement due to high-speed liquid flows, which agitate foreign substances and hinder the removal of contaminants, leading to potential contamination and processing failures, especially with acid chemicals and hydrophobic surfaces.

Innovation Solution

The apparatus features a processing bath with a first discharge part that directs processing liquid toward the side or bottom walls to create low-speed, uniform flows, allowing foreign substances to float and be drained, while a second discharge part can generate high-speed flows for uniform processing, and a controller manages the discharge parts based on processing needs.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If processing liquid is discharged toward the inside of the processing bath to form high-speed liquid flows, then uniform processing of substrates is achieved, but foreign substances are agitated and cannot be efficiently removed from the processing bath

Engineering Contradiction:

Improveuniformity of processingVSAvoidcontamination by foreign substances

Core Design Contradiction:

Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The discharge nozzles are divided into two distinct groups: first discharge nozzles (351, 352) that discharge toward the side walls to create low-speed flows for removing foreign substances, and second discharge nozzles (331, 332, 341, 342) that discharge toward the inside of the bath to create high-speed flows for uniform processing. This segmentation allows independent optimization of each function without interference.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

Different regions of the processing bath are assigned different flow characteristics: the peripheral regions near side walls receive low-speed flows from the first discharge nozzles to facilitate foreign substance removal, while the central region receives high-speed flows from the second discharge nozzles to ensure uniform processing. Each region has optimized flow conditions suited to its specific function.

Inventive Principle:

Principle #3Local quality

2Productivity

If processing liquid is discharged to form low-speed liquid flows, then foreign substances can float and be drained efficiently, but uniform processing of substrates cannot be achieved

Engineering Contradiction:

Improveefficiency of liquid replacementVSAvoiduniformity of processing

Core Design Contradiction:

ProductivityVSManufacturing precision

Solution Approach 1:

The discharge nozzles are divided into two distinct groups: first discharge nozzles (351, 352) that discharge toward the side walls to create low-speed flows for removing foreign substances, and second discharge nozzles (331, 332, 341, 342) that discharge toward the inside of the bath to create high-speed flows for uniform processing. This segmentation allows independent optimization of each function without interference.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The control device alternates between two operational modes: a first mode where the first discharge nozzles operate at high output to rapidly remove foreign substances and replace processing liquid, and a second mode where the second discharge nozzles operate to provide uniform processing flows. This periodic switching enables the system to achieve both high replacement efficiency and processing uniformity at different times as needed.

Inventive Principle:

Principle #19Periodic action

3Device complexity

If a single discharge configuration is used, then device complexity is reduced, but the system cannot adapt to different processing requirements for uniform processing versus efficient liquid replacement

Engineering Contradiction:

Improvenumber of discharge nozzlesVSAvoidability to form different liquid flows

Core Design Contradiction:

Device complexityVSAdaptability or versatility

Solution Approach 1:

The discharge nozzles are divided into two distinct groups: first discharge nozzles (351, 352) that discharge toward the side walls to create low-speed flows for removing foreign substances, and second discharge nozzles (331, 332, 341, 342) that discharge toward the inside of the bath to create high-speed flows for uniform processing. This segmentation allows independent optimization of each function without interference.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The system dynamically adjusts its operation by having a control device that can independently activate different discharge nozzle groups based on processing requirements. The control device switches between operating modes: using first discharge nozzles for rapid liquid replacement and foreign substance removal, and second discharge nozzles for uniform processing, thereby adapting to different processing conditions as needed.

Inventive Principle:

Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration enables efficient drainage of used liquids, reduces contamination risks, and maintains processing quality by ensuring uniform liquid distribution and replacement, enhancing the overall processing efficiency and substrate cleanliness.

Implementation Method 1

a first discharge part for discharging the processing liquid toward one of the side wall and the bottom wall within the processing bath

Methodology Applied

Scientific EffectLiquid flow:

Implementation Method 2

the processing liquid discharged from the discharge nozzles 113 forms relatively high-speed liquid flows within the processing bath 110 and is agitated all over the inside of the processing bath 110

Methodology Applied

Scientific EffectHigh-speed liquid flow:

Implementation Method 3

a drainage part for draining the processing liquid overflowing from a top portion of the processing bath

Methodology Applied

Scientific EffectLiquid drainage:

Data Source

PatentUS8043468B2Apparatus for and method of processing substrate

Publication Date: 2011.10.25 SCREEN HOLDINGS CO LTD

AI summary

A substrate processing apparatus discharges a hydrofluoric acid solution from discharge nozzles toward grooves formed in side walls of an inner bath. The hydrofluoric acid solution discharged from the discharge nozzles impinges upon the grooves to diffuse, thereby moving toward a top portion of the inner bath in the form of low-speed uniform liquid flows. Thus, a metal component and foreign substances generated in the inner bath float up toward the top portion of the inner bath without being agitated within the inner bath, and are rapidly drained to an outer bath together with the hydrofluoric acid solution.