Substrate Bonding Device with Segmented Vacuum Fixation

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Solution Overview

Problem

In the semiconductor industry, achieving precise and contamination-free bonding of substrates with high alignment accuracy is challenging due to the difficulty in reliable and gentle detachment of wafers from receiving devices, especially with thin and double-sided polished wafers, and the need for exact adjustment accuracy below 250nm.

Innovation Solution

A device and method for bonding substrates using a receiving device with controllable deformation means to apply prestress radially to the substrate, reducing the effective receiving area and allowing for controlled bonding and detachment, while maintaining precise alignment and minimizing distortion.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If vacuum fixation is applied between the wafer and receiving device, then reliable support and fixation are achieved, but detachment becomes increasingly difficult with thin and double-sided polished wafers

Engineering Contradiction:
Improvefixation reliabilityVSAvoiddetachment ease
Core Design Contradiction:
ReliabilityVSEase of operation

Solution Approach 1:

The receiving surface is divided into a fixation area (outer ring section) and a release area (inner region), allowing selective detachment. The fixation means act only on the outer ring section while the inner region remains free for gentle release, resolving the contradiction between reliable fixation and easy detachment.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different regions of the receiving surface have different properties: the outer ring section has fixation capability through vacuum or electrostatic charging, while the inner region has release capability. This local differentiation allows simultaneous achievement of reliable fixation and gentle detachment.

Inventive Principle:
Principle #3Local quality

2Ease of operation

If the contact surface area is reduced to enable gentle detachment, then detachment ease improves, but alignment precision and bonding quality deteriorate

Engineering Contradiction:
Improvedetachment easeVSAvoidalignment precision
Core Design Contradiction:
Ease of operationVSManufacturing precision

Solution Approach 1:

The receiving surface is segmented into fixation area and release area. The fixation area provides sufficient contact for precise alignment during bonding, while the release area enables gentle detachment, resolving the contradiction between alignment precision and detachment ease.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Alignment and bonding are performed first on the fixation area, ensuring precise positioning. Detachment is then performed selectively from the release area, maintaining both alignment precision and gentle release.

Inventive Principle:
Principle #10Preliminary action

3Manufacturing precision

If alignment accuracy is increased to below 250nm, then bonding quality improves, but the complexity of controlling influencing factors increases

Engineering Contradiction:
Improvealignment accuracyVSAvoidcontrol complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The receiving surface is differentiated into fixation area for precise alignment and release area for gentle detachment. This local quality differentiation simplifies control by separating the alignment function from the detachment function, reducing the complexity of controlling multiple influencing factors simultaneously.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables gentle and reliable detachment of wafers with minimal force and distortion, achieving high alignment accuracy and minimizing contamination, with the ability to maintain precise bonding across the substrate surface.

Implementation Method 1

The fixation takes place, for example, by applying a vacuum between the wafer and the receiving device

Methodology Applied
Scientific EffectVacuum: Vacuum

Implementation Method 2

at least one of the substrates is subjected to a prestress that runs radially outwards, in particular concentrically to the center M of a contact surface of the substrate

Methodology Applied
Scientific EffectMechanical Force: Mechanical Force

Data Source

PatentEP3886149A1Method and device for bonding substrates
Publication Date: 2021.09.29 EV GRP E THALLNER GMBH
  • EP3886149A1 patent drawingFigure 1a~1b
  • EP3886149A1 patent drawingFigure 2a~2b
  • EP3886149A1 patent drawingFigure 3a~3b

AI summary

The present invention relates to a device for bonding a first substrate (15) to a second substrate, comprising: - a receiving device for receiving the first substrate (15) on a receiving contour (8, 8', 8", 8"', 8IV) with an effective receiving surface (7, 7', 7", 7"', 7IV) of the receiving device with an outer ring section (10) for controllable fixation of the first substrate (15), - deformation means for controllable deformation of the first substrate (15), wherein the deformation means are designed to act within the outer ring section, and - bonding means for bonding the first substrate (15) to the second substrate ().The invention further relates to a method for bonding a first substrate (15) to a second substrate comprising the following steps, in particular the following sequence: - receiving the first substrate (15) on a receiving contour (8, 8', 8", 8"') with an effective receiving surface (7, 7', 7", 7"', 7IV) of the receiving device (1) with an outer ring section (10) for controllable fixation of the first substrate (15), - deformation of the first substrate (15) within the outer ring section by means of deformation means for controllable deformation of the first substrate (15), - bonding of the first substrate (15) to the second substrate by means of bonding means.