Semiconductor Substrate Transport Box Inert Atmosphere Control

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Solution Overview

Problem

Semiconductor manufacturing plants face low yield and flexibility due to pollution issues during substrate transfer between processing equipment, primarily caused by airborne molecular contamination from reactive gases, which leads to defects in products.

Innovation Solution

A device and method that dynamically manage substrate batch storage and transport by analyzing critical gas concentrations within storage and transport boxes, using gas analysis devices to determine decontamination needs and optimize storage and transport times, incorporating both internal vacuum and open thermal decontamination stations to minimize contamination exposure.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If substrates are stored for long periods between processing steps, then productivity is improved by allowing flexible scheduling, but contamination from airborne molecular contamination increases causing defects

Engineering Contradiction:

Improvemanufacturing productivityVSAvoidyield

Core Design Contradiction:

ProductivityVSReliability

Solution Approach 1:

The patent applies inert atmosphere by introducing a nitrogen atmosphere into the transport box to displace reactive gases. The nitrogen acts as an inert gas that prevents chemical reactions between substrates and airborne contaminants, thereby maintaining substrate quality during extended storage periods while enabling flexible manufacturing scheduling.

Inventive Principle:

Principle #39Inert atmosphere (Inert environment)

Solution Approach 2:

The patent changes the atmospheric composition parameter within the transport box by introducing nitrogen gas. This parameter change transforms the reactive atmosphere into an inert one, fundamentally altering the chemical environment to prevent contamination while allowing longer storage times without compromising substrate integrity.

Inventive Principle:

Principle #35Parameter changes

2Adaptability or versatility

If maximum storage time is extended to increase flexibility, then adaptability improves, but contamination-related defects increase reducing yield

Engineering Contradiction:

ImproveflexibilityVSAvoidyield

Core Design Contradiction:

Adaptability or versatilityVSReliability

Solution Approach 1:

By creating an inert nitrogen atmosphere in the transport box, the system enables extended storage times with improved flexibility for scheduling adjustments. The inert environment prevents contamination reactions, allowing the system to adapt to varying production requirements without compromising substrate quality or yield.

Inventive Principle:

Principle #39Inert atmosphere (Inert environment)

3Device complexity

If reactive gases are present in storage atmosphere, then no special decontamination equipment is needed, but molecular contamination occurs creating defects

Engineering Contradiction:

Improveequipment complexityVSAvoidyield

Core Design Contradiction:

Device complexityVSReliability

Solution Approach 1:

The patent introduces nitrogen gas into the transport box to create an inert atmosphere that prevents molecular contamination. This approach maintains relatively simple equipment while dramatically improving yield by eliminating chemical reactions between substrates and reactive gases during storage and transport.

Inventive Principle:

Principle #39Inert atmosphere (Inert environment)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach increases yield and flexibility by reducing contamination risks, allowing for longer storage times when contamination is low and prioritizing rapid transport when contamination levels are high, thereby enhancing the reliability and efficiency of the manufacturing process.

Implementation Method 1

a device to analyze the gases forming the internal atmosphere of the substrate storage and transport box

Methodology Applied

Scientific EffectGas analysis:

Implementation Method 2

internal vacuum decontamination stations

Methodology Applied

Scientific EffectVacuum: Vacuum

Implementation Method 3

open thermal decontamination stations

Methodology Applied

Scientific EffectThermal decontamination: Heating

Data Source

PatentUS9779972B2Method and device for controlling the manufacture of semiconductor by measuring contamination

Publication Date: 2017.10.03 PFEIFFER VACUUM SAS

AI summary

A device for handling substrates within a semiconductor manufacturing plant having substrate processing equipments, substrate storage means, substrate transport means, and a manufacturing execution system (MES) functionally related with the substrate processing equipments, the substrate storage means and the substrate transport means, including at least one substrate storage and transport box that is transported by the transport means and stored in the storage means; at least one gas analysis device of the gases forming the internal atmosphere of the substrate storage and transport box, which produces analysis signals representative of the quantity of the critical gas that is likely to generate molecular contamination, which is present in the storage and transport box; and an execution device which pilots the transport means and the storage means, with the execution device comprising instructions for detecting a molecular decontamination need as a function of analysis signals emitted by the gas analysis device.