Substrate Processing Bubble Distribution via Segmented Liquid Supply
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Solution Overview
Problem
Existing substrate processing apparatuses face issues with uneven bubble distribution in processing liquids, leading to regions with insufficient bubbles on and around substrates, which can result in uneven processing conditions.
Innovation Solution
A substrate processing apparatus with a processing tank, substrate holding section, bubble supply section, and multiple processing liquid supply sections, where the liquid supply sections are grouped and controlled to supply processing liquid differently to each group, adjusting flow rates to ensure uniform bubble distribution and processing conditions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If only the amount of bubbles is controlled in the substrate processing apparatus, then the bubble generation is simplified, but the bubble distribution in the treatment liquid becomes uneven according to processing conditions
Solution Approach 1:
The processing tank is divided into multiple regions (first region and second region) with different bubble generation requirements. The bubble generating tubes are correspondingly segmented into first bubble generating tubes for the first region and second bubble generating tubes for the second region, allowing independent control of bubble amounts in different areas to achieve uniform overall distribution.
Solution Approach 2:
Different bubble flow rates are supplied to different bubble generating tubes located in different regions of the processing tank. The first bubble generating tubes receive a first bubble flow rate while the second bubble generating tubes receive a second bubble flow rate, creating locally optimized bubble distributions that compensate for regional variations in processing conditions.
2Quantity of substance
If the flow rate of gas is increased to end bubble generating tubes, then the amount of bubbles at the ends is increased, but processing unevenness may occur in the central region
Solution Approach 1:
The system supplies different bubble flow rates to different regions: higher flow rates to end regions where bubbles are typically insufficient, and adjusted flow rates to the central region. This local optimization ensures adequate bubble coverage at ends while preventing over-saturation in the center, maintaining overall processing uniformity.
Solution Approach 2:
The bubble generation system is segmented into multiple independently controllable zones with different gas flow rates. This segmentation allows the end regions to receive higher bubble flow rates while the central region receives appropriately reduced flow rates, preventing the processing unevenness that would result from uniform high-flow-rate application throughout.
3Quantity of substance
If processing liquid is supplied continuously to all regions, then the processing liquid coverage is improved, but the bubble distribution uniformity deteriorates due to varying processing conditions in different regions
Solution Approach 1:
The processing liquid supply system is segmented into first and second processing liquid supply sections corresponding to the first and second regions. Each section supplies processing liquid independently to its respective region, allowing the liquid flow rates to be optimized for local conditions while maintaining overall coverage. This segmentation enables different liquid flow rates in different regions to compensate for variations in processing conditions.
Solution Approach 2:
Different processing liquid flow rates are supplied to different regions based on their specific processing conditions. The first processing liquid supply section supplies liquid to the first region while the second processing liquid supply section supplies liquid to the second region, creating locally optimized liquid coverage that works in conjunction with the differentiated bubble generation rates to achieve uniform bubble distribution.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces areas with insufficient bubbles on substrates, leading to more uniform processing and reduced dissolved oxygen concentration across the substrate surfaces, thereby minimizing processing unevenness.
Implementation Method 1
The bubble supply section is disposed in the processing tank and supplies bubbles to the processing liquid from below the substrate
Implementation Method 2
The processing liquid supply sections are disposed at the processing tank and supply the processing liquid to an interior of the processing tank
Data Source
AI summary
A substrate processing apparatus includes a processing tank, a substrate holding section, a bubble supply section, and processing liquid supply sections. The substrate holding section immerses a substrate in a processing liquid stored in the processing tank. The bubble supply section supplies bubbles to the processing liquid from below the substrate. The processing tank includes a first side wall and a second side wall. The processing liquid supply sections include one or more first processing liquid supply sections and one or more second processing liquid supply sections. The one or more first processing liquid supply sections are disposed on a side of the first side wall and supply the processing liquid toward the bubbles. The one or more second processing liquid supply sections are disposed on a side of the second side wall and supply the processing liquid toward the bubbles.