Substrate Case Cleaning with Segmented Support Rods
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Solution Overview
Problem
Conventional substrate case cleaning apparatuses often fail to ensure thorough cleaning of the shell and base components due to inadequate reach of the cleaning solution, particularly when these parts are attached to the lid for cleaning.
Innovation Solution
The substrate case cleaning apparatus features a rotating plate with support rods at different heights within the cleaning tank, allowing the base and shell to be separated and positioned for even exposure to the cleaning solution, along with a conveyance mechanism and control system to manage the support and release of these components, and an optional holding mechanism to prevent unnecessary cleaning of outside surfaces.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If the base is attached to the lid for cleaning, then the cleaning process can be simplified, but the cleaning solution cannot sufficiently reach the lid-side surface of the base
Solution Approach 1:
The base is divided into two sides: the lid-side surface and the opposite surface. During cleaning, only the opposite surface is exposed to the cleaning solution while the lid-side surface is protected by the lid structure. This segmentation allows the cleaning process to focus on the accessible surface without compromising overall cleaning quality.
Solution Approach 2:
The lid acts as an intermediary element that serves dual purposes: it protects the lid-side surface of the base from contamination during cleaning, and it provides a stable mounting surface for the base. The lid mediates between the cleaning solution and the base, allowing efficient cleaning of the opposite surface while preventing unnecessary exposure of the lid-side surface.
2Device complexity
If the shell is attached to the lid for cleaning, then the cleaning process can be simplified, but the cleaning solution cannot sufficiently reach the lid-side surface of the shell
Solution Approach 1:
The shell is segmented into the lid-side surface and the opposite surface. The cleaning process is designed to clean only the opposite surface that is exposed to the cleaning solution, while the lid-side surface remains protected by the lid structure.
Solution Approach 2:
The lid serves as an intermediary that protects the lid-side surface of the shell during cleaning. It allows the cleaning solution to effectively reach the opposite surface while preventing contamination of the lid-side surface, maintaining cleaning quality without increasing process complexity.
3Manufacturing precision
If the base and shell are cleaned separately in the cleaning tank, then the cleaning solution can reach all surfaces evenly, but the cleaning process becomes more complex
Solution Approach 1:
The substrate case is segmented into the base and shell components. Each component is cleaned separately in the cleaning tank, allowing the cleaning solution to reach all surfaces evenly without interference from the other component. This segmentation ensures high cleaning quality for both parts.
Solution Approach 2:
The cleaning process maintains continuity by keeping the base and shell in the cleaning tank simultaneously, both exposed to the cleaning solution. This continuous cleaning action ensures that both components are cleaned evenly and efficiently, maximizing the useful action of the cleaning solution.
4Manufacturing precision
If the cleaning solution reaches all surfaces of the base and shell, then cleaning quality improves, but drying time increases
Solution Approach 1:
The lid-side surfaces of both the base and shell are extracted from the cleaning process by protecting them with the lid structure. Only the necessary opposite surfaces are exposed to the cleaning solution, reducing the total surface area that requires drying while maintaining cleaning quality on the exposed surfaces.
Solution Approach 2:
Instead of cleaning all surfaces of the base and shell, the process applies partial cleaning only to the opposite surfaces that are exposed to the cleaning solution. This partial action reduces the amount of cleaning solution on the components, thereby reducing drying time while maintaining sufficient cleaning quality on the cleaned surfaces.
Data Source
AI summary
Parts of a substrate case can be separated and cleaned inside a tank body while making the cleaning solution evenly reach it. A substrate case C which is provided with a base Mb and shell Ms and holds a substrate inside is cleaned in a state with no substrate. Provision is made of a cleaning tank 40 which holds and cleans the parts of the base Mb and shell Ms of the substrate case C in a separated stated, provision is made of a conveyance mechanism which conveys the parts of the substrate case with the cleaning tank 40, and the cleaning tank 40 is provided with a tank body 42 and a lid 43 which can be opened and closed and is provided with a rotating plate 44 which is provided at a bottom part of the tank body 42 to be able to rotate about an axis in the vertical direction, a plurality of base support rods 46 which are provided standing up at the rotating plate 44 and which support parts of the outer edge of the base Mb at a predetermined height position, and a plurality of shell support rods 47 which are provided standing up at the rotating plate 44 and which support parts of the outer edge of the shell Ms at a predetermined height position different from the base support rods 46.