Substrate Processing Chamber Cleaning for Acidic Gas Containment

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Solution Overview

Problem

The discharge of toxic acidic gases, such as hydrochloric acid gas, from substrate processing chambers poses a risk of personal injury when the chamber is left open for maintenance or inspection.

Innovation Solution

A substrate processing apparatus and method that maintains a lower pressure inside the processing chamber than outside, performing emergency cleaning operations when the pressure difference exceeds a threshold, and includes periodic and maintenance cleaning to prevent gas discharge during chamber openings.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Object-affected harmful factors

If the chamber is kept closed to prevent acidic gas discharge, then operator safety is improved, but maintenance and inspection operations become difficult

Engineering Contradiction:
Improveacidic gas dischargeVSAvoidmaintenance access
Core Design Contradiction:
Object-affected harmful factorsVSEase of operation

Solution Approach 1:

The system performs preliminary actions by continuously monitoring pressure differential and automatically initiating cleaning operations before the chamber is opened. The pressure sensor detects when internal pressure exceeds external pressure, triggering the cleaning mechanism in advance to eliminate acidic gas hazards before operator exposure becomes possible

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The system employs feedback control through pressure sensors that continuously monitor the pressure differential between chamber interior and exterior. When the pressure differential exceeds a predetermined threshold, the controller automatically activates the cleaning operation, creating a closed-loop safety system that responds to actual conditions rather than relying on manual intervention

Inventive Principle:
Principle #23Feedback

2Object-affected harmful factors

If the chamber pressure is maintained lower than outside pressure, then acidic gas leakage is prevented, but pressure control system complexity increases

Engineering Contradiction:
Improvegas leakage preventionVSAvoidpressure control system
Core Design Contradiction:
Object-affected harmful factorsVSDevice complexity

Solution Approach 1:

The system changes the critical parameter from maintaining continuous negative pressure to monitoring pressure differential thresholds. By switching from an active pressure maintenance approach to a threshold-based triggering mechanism, the system reduces the complexity of continuous pressure control while achieving the same safety objective through automated cleaning when pressure conditions indicate potential leakage risk

Inventive Principle:
Principle #35Parameter changes

3Object-affected harmful factors

If automated cleaning operations are implemented, then safety is improved, but device complexity and operational time increase

Engineering Contradiction:
Improveoperator safetyVSAvoidcleaning control system
Core Design Contradiction:
Object-affected harmful factorsVSDevice complexity

Solution Approach 1:

The system implements self-service automation where the cleaning mechanism serves itself through automatic triggering. The pressure sensor and controller work together to autonomously initiate cleaning operations without external intervention, making the safety system self-regulating and reducing the need for complex manual control procedures while improving operator safety

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Prevents the accidental release of acidic gases by automatically initiating cleaning operations when the chamber is opened, ensuring operator safety.

Implementation Method 1

a substrate processing operation of processing a substrate by supplying a treatment liquid to a substrate loaded into a processing space of a processing container... performed at a pressure at which a pressure in the processing space is lower than a pressure outside the processing space

Methodology Applied
Scientific EffectPressure difference: Pressure Gradient

Implementation Method 2

an emergency cleaning operation of temporarily cleaning the interior of the processing container... including supplying a cleaning liquid to a support unit rotating in the processing space to clean an upper surface of the support unit and an inner surface of the processing container

Methodology Applied
Scientific EffectLiquid cleaning:

Implementation Method 3

supplying a cleaning liquid to a support unit rotating in the processing space to clean an upper surface of the support unit and an inner surface of the processing container

Methodology Applied
Scientific EffectRotational motion:

Data Source

PatentUS20250205760A1Substrate processing apparatus and substrate processing method
Publication Date: 2025.06.26 SYSTEM ENGINEERING MEGA SOLUTION CO LTD
  • US20250205760A1 patent drawing
  • US20250205760A1 patent drawing
  • US20250205760A1 patent drawing

AI summary

Disclosed is a method of processing a substrate, the method including: a substrate processing operation of processing a substrate by supplying a treatment liquid to a substrate loaded into a processing space of a processing container; and a container cleaning operation of cleaning an interior of the processing container in a state where the substrate is unloaded from the processing space, in which the container cleaning operation includes: a periodic cleaning operation of periodically cleaning the interior of the processing container; and an emergency cleaning operation of temporarily cleaning the interior of the processing container when a set condition is satisfied.