Substrate Chamber Imaging for Adaptive Monitoring Conditions
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Solution Overview
Problem
Existing substrate processing methods struggle with inefficient monitoring of multiple targets due to inconsistent image data conditions, leading to increased processing load and reduced accuracy in monitoring various stages of substrate processing.
Innovation Solution
A substrate processing method that adjusts image conditions such as resolution and frame rate based on specific monitoring targets, including different frame rates for object position/shape and processing liquid state changes, allowing for optimized monitoring processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If image data is acquired in a wide visual field range at a high resolution and a high frame rate, then the monitoring coverage and detail quality are improved, but the data amount becomes unnecessarily large and the processing load increases
Solution Approach 1:
The patent applies local quality by setting different image conditions (resolution, frame rate, visual field range) according to different monitoring targets and processing stages. For example, during substrate movement, a lower frame rate is used compared to during processing liquid ejection, and different resolution levels are applied to different regions of interest within the chamber.
Solution Approach 2:
The patent implements dynamic adjustment of image acquisition conditions based on the current processing stage and monitoring requirements. The system dynamically changes parameters such as frame rate and resolution according to whether the substrate is moving, whether processing liquid is being ejected, and which specific targets need monitoring at each moment.
2Device complexity
If a single image condition is used for all monitoring targets, then the system complexity is reduced, but the monitoring accuracy for different targets deteriorates
Solution Approach 1:
The patent implements local quality by assigning different image conditions to different monitoring targets and processing stages. For instance, high frame rate imaging is used when monitoring processing liquid ejection, while lower frame rate is sufficient for monitoring substrate position, and different resolution levels are applied based on the specific monitoring requirements of each target.
Solution Approach 2:
The system dynamically adjusts image conditions based on the current monitoring needs. The control unit determines appropriate image conditions for each processing stage and monitoring target, changing parameters such as frame rate, resolution, and visual field range to match the specific requirements of each monitoring task.
Data Source
AI summary
A substrate processing method includes: a holding step of carrying a substrate into an inside of a chamber and holding said substrate; a supply step of supplying a fluid to the substrate on the inside of the chamber; an imaging step of sequentially imaging the inside of the chamber by a camera to acquire image data; a condition setting step of specifying a monitoring target and changing an image condition based on the monitoring target; and a monitoring step of performing a monitoring process on the monitoring target based on the image data having the image condition corresponding to the monitoring target.