Substrate Chamber Gap Detection Using Pneumatic Pressure Feedback
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Solution Overview
Problem
In the photolithography process for semiconductor manufacturing, it is challenging to accurately determine whether the interval between process chambers is at a preset interval and uniform, especially when the chambers are being opened and closed.
Innovation Solution
A substrate treating apparatus equipped with a process chamber that includes a first and second body, a support unit, a heating unit, a driver for moving the bodies, an interval state detection unit that uses pressure provision and measurement to determine the interval state, and a controller to adjust the positions based on the detected state.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If the chamber is opened and closed during the bake process, then the substrate can be loaded and unloaded, but it becomes difficult to identify whether the chamber is in the correct location and whether the interval between chamber bodies is uniform
Solution Approach 1:
The patent replaces mechanical measurement methods with a pneumatic field-based measurement system. Pressure sensors detect interval uniformity by measuring pressure distribution changes when air is introduced between chamber bodies, eliminating the need for mechanical gauges or visual inspection that would be inaccessible when the chamber is closed during operation.
Solution Approach 2:
The patent introduces air as an intermediary substance to transmit measurement information. By injecting air between the chamber bodies and measuring the resulting pressure distribution through sensors, the system indirectly detects interval uniformity without requiring direct physical contact or visual access to the gap between bodies.
2Reliability
If the chamber bodies are spaced apart during the bake process, then the substrate can be treated, but it becomes difficult to identify whether the bodies are spaced by a preset interval and whether they are tilted or biased
Solution Approach 1:
The patent implements a feedback control system where pressure sensors continuously monitor the interval between chamber bodies during the bake process. The control unit receives pressure distribution data and provides feedback to adjust the positioning of chamber bodies, ensuring they maintain the preset interval and proper alignment throughout the substrate treatment process.
Solution Approach 2:
The patent transforms the static chamber structure into a dynamically adjustable system. The chamber bodies are equipped with positioning mechanisms that can be adjusted in real-time based on pressure sensor feedback, allowing the system to adapt and maintain precise interval uniformity even during thermal expansion or mechanical drift in the bake process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively identifies and maintains the interval between the process chambers at a preset interval, ensuring uniformity and accuracy, which is crucial for consistent semiconductor device production.
Implementation Method 1
an interval state detection unit that detects an interval state between a side wall of the first body and a side wall of the second body when the first body and the second body are placed in the process location, and the interval state detection unit includes a pressure provision line that provides a positive pressure or a negative pressure between the side wall of the first body and the side wall of the second body
Implementation Method 2
a pressure measurement member that measures a change in a pressure of the pressure provision line, and wherein the controller determines whether or not the interval state is defective on the basis of the pressure measured by the pressure measurement member
Implementation Method 3
a heating unit that heats the substrate placed on the support unit
Data Source
AI summary
The inventive concept relates to a substrate treating apparatus including a process chamber having a first and a second body, a support unit supporting a substrate, a heating unit heats the substrate, a driver moves any one of the first body and the second body, an interval state detection unit that detects an interval state between a side wall of the first body and a side wall of the second body when the first and the second body are placed in a process location, and a controller that controls the driver and the interval state detection unit, wherein the interval state detection unit includes a pressure provision line that provides a positive pressure or a negative pressure between the side wall of the first body and the side wall of the second body, and a pressure measurement member that measures a change in a pressure of the pressure provision line.