Substrate Transport Chamber with In-Situ Nitrogen Purge Against Oxidation

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Solution Overview

Problem

The oxidation of substrates due to oxygen-containing air flow in substrate transport chambers leads to deterioration of film properties during semiconductor processing.

Innovation Solution

A substrate transport chamber equipped with an air separation unit that separates nitrogen and oxygen from the air supply, using a filter to allow only nitrogen to purge the substrate transport unit, preventing oxidation and maintaining a laminar flow to suppress contaminants.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If nitrogen is used to purge the substrate transport unit to prevent oxidation, then film quality is improved, but operational costs increase due to nitrogen consumption

Engineering Contradiction:
Improvefilm qualityVSAvoidnitrogen consumption
Core Design Contradiction:
Manufacturing precisionVSLoss of substance

Solution Approach 1:

The patent recovers and recycles the nitrogen-rich gas after it has served its protective function by circulating it back through the system, thereby reducing the need for continuous nitrogen supply and lowering operational costs while maintaining film quality protection

Inventive Principle:
Principle #34Discarding and recovering

Solution Approach 2:

The system generates its own protective atmosphere by processing ambient air through the oxygen removal device, making the system self-sufficient for nitrogen generation and eliminating dependence on external nitrogen gas supplies

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Prevents substrate oxidation and contaminant accumulation, ensuring film quality while reducing operational costs by recycling fab environment air for nitrogen generation.

Implementation Method 1

an air separation unit that separates nitrogen and oxygen from the air supply, using a filter to allow only nitrogen to purge the substrate transport unit

Methodology Applied
Scientific EffectFiltration: Filter (physical)

Data Source

PatentUS20250357162A1Substrate transport chamber with in-situ nitrogen purge function and apparatus using the same
Publication Date: 2025.11.20 ASM IP HLDG BV
  • US20250357162A1 patent drawing
  • US20250357162A1 patent drawing
  • US20250357162A1 patent drawing

AI summary

Provided is a substrate transport chamber including a substrate transport chamber and an air separation unit. The air separation unit separates an air into a nitrogen and an oxygen. The nitrogen separated from the air is supplied to the substrate transport unit to purge the substrate transport unit and the oxygen separated from the air is exhausted outside of the substrate transport chamber.