Substrate Processing Chamber Partitioning for Odor Leakage Control
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Solution Overview
Problem
Existing substrate processing apparatuses struggle to effectively prevent the leakage of processing liquids with strong odors, leading to degradation of the working environment due to atmospheric leakage.
Innovation Solution
A substrate processing apparatus with a chamber design that includes a partition plate and processing cup to create a pressure differential between the processing and non-processing spaces, guided by a downward airflow, reducing odor leakage and interference between the nozzle and lid.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a partition structure is introduced to separate processing space from non-processing space, then odor leakage is suppressed, but device complexity increases
Solution Approach 1:
The chamber is divided into a processing space and a non-processing space by a partition structure. The partition includes a partition plate with through-holes and a processing cup that can be positioned in different states (first state: spaced apart from the substrate; second state: overlapping with the substrate). This segmentation isolates the processing space where odors are generated from the non-processing space, suppressing odor leakage while maintaining operational simplicity.
Solution Approach 2:
The processing cup is configured to be movable between a first state (spaced apart from the substrate) and a second state (overlapping with the substrate in plan view). This dynamic configuration allows the partition structure to adapt during different operational phases: in the first state, it maintains separation for odor suppression; in the second state, it allows processing access while still providing partial containment.
2Object-affected harmful factors
If downward airflow is supplied to form a pressure differential, then atmosphere leakage is suppressed, but energy consumption increases
Solution Approach 1:
A downward airflow is supplied into the chamber to create a pressure differential between the processing space and the non-processing space. The partition plate with through-holes allows controlled airflow while maintaining pressure difference. This pneumatic approach suppresses atmosphere leakage by directing airflow downward, preventing odors from rising into the non-processing space, while the controlled nature of the airflow minimizes energy consumption.
3Object-affected harmful factors
If the processing cup overlaps with the substrate in plan view, then processing space is effectively isolated, but accessibility for substrate loading/unloading is reduced
Solution Approach 1:
The processing cup is designed to be movable between a first state (spaced apart from the substrate) and a second state (overlapping with the substrate in plan view). During substrate loading and unloading operations, the processing cup is positioned in the first state to provide accessibility. During processing operations, it transitions to the second state to provide effective isolation of the processing space, thus resolving the contradiction between isolation effectiveness and operational accessibility.
4Object-affected harmful factors
If the nozzle opening is covered by the lid, then odor leakage through the nozzle is prevented, but processing liquid supply is blocked
Solution Approach 1:
The lid is configured to cover the nozzle opening from above, providing localized containment at the specific location where odors would escape through the nozzle. This local quality approach prevents odor leakage through the nozzle area without blocking the processing liquid supply, as the lid allows liquid to pass through while containing gaseous odors. The partition structure provides additional localized containment in other areas.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively suppresses odor leakage and prevents processing defects by maintaining lower pressure in the processing space, enhancing environmental comfort and processing efficiency.
Implementation Method 1
the pressure in the processing space is set lower than the pressure in the non-processing space
Implementation Method 2
a downward airflow is formed in the casing
Data Source
AI summary
A development device includes a casing, an airflow former and a substrate holding device. The airflow former forms a downward flow of clean air in the inner space of the casing. The development device further includes a plurality of nozzles and a partition mechanism. The plurality of nozzles supply a processing liquid to a substrate held by the substrate holding device. The partition mechanism partitions the inner space of the casing into a processing space and a non-processing space with a substrate held by the substrate holding device. The processing space is a space including a substrate held by the substrate holding device. The partition mechanism includes a cup that receives a processing liquid that splashes from a substrate, a partition plate that has a nozzle opening and a plurality of through holes and is provided above the cup and a cover member that covers the nozzle opening.