Supercritical Substrate Chamber Particle Intake at Vessel Opening
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The challenge in substrate processing using supercritical fluids is the accumulation of floating particles around the heating unit due to stagnant airflow, which can lead to process defects as these particles penetrate into the processing space when the vessels are opened.
Innovation Solution
A substrate processing apparatus with a clamping unit that seals and opens to create a controlled environment, incorporating an intake unit with intake members and a cleaning unit that uses inert gas to prevent particle entry, and a cover unit to block airflow from the heating area, ensuring efficient particle removal.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If the heating unit operates at high temperature to generate supercritical fluid, then the supercritical fluid can effectively process the substrate, but particles float around the heating unit due to stagnant airflow
Solution Approach 1:
The patent extracts and removes floating particles from the processing environment using a dedicated particle removal unit that generates airflow to extract particles away from the substrate and heating unit area, thereby resolving the contradiction between maintaining high temperature and preventing particle accumulation
Solution Approach 2:
The patent introduces an intermediary airflow field generated by the particle removal unit that acts as a mediator between the heating unit and the surrounding environment, carrying away particles without interfering with the supercritical fluid processing function
2Ease of operation
If the vessels are opened to access the substrate, then substrate manipulation is enabled, but particles enter the processing space from the open space between vessels
Solution Approach 1:
The patent performs preliminary particle removal by the particle removal unit before the vessels are fully opened, creating a particle-free zone around the processing space that protects against contamination during substrate manipulation
Solution Approach 2:
The patent uses controlled airflow as an intermediary barrier that allows vessel opening for substrate access while simultaneously preventing particle entry into the processing space through the airflow direction and pressure control
3Object-affected harmful factors
If airflow is increased to prevent particle accumulation, then particle removal is improved, but the supercritical fluid processing is disrupted
Solution Approach 1:
The patent segments the airflow system into two independent parts: a particle removal unit that generates airflow for particle extraction, and the supercritical fluid processing system that maintains its own controlled environment, allowing both functions to operate simultaneously without interference
Solution Approach 2:
The patent applies local quality control by directing particle removal airflow specifically at particle-prone areas around the heating unit and vessel openings, while maintaining different airflow conditions in the supercritical fluid processing zone to ensure processing stability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively prevents particles from entering the processing space, maintaining the cleanliness and integrity of the substrate processing environment, thereby reducing defects and ensuring reliable operations.
Implementation Method 1
a heating unit for heating the fluid to a high temperature in order to generate and maintain the supercritical fluid
Implementation Method 2
the supercritical fluid easily penetrates into the pattern on the substrate
Implementation Method 3
the supercritical fluid easily dissolves the remaining rinse solution
Implementation Method 4
an intake unit configured to intake a particle by including an intake member positioned to correspond to an open space between the first vessel and the second vessel in the open position
Implementation Method 5
a cleaning unit positioned to correspond to the open space between the first vessel and the second vessel in the open position, and for supplying an inert gas to the open space to perform a blow operation before the intake unit performs an intake operation
Implementation Method 6
a cover unit installed in the clamping unit and disposed between the vessel and the heating unit, and for blocking airflow from a space where the heating unit is installed to a space where the vessel is installed
Data Source
AI summary
A substrate processing apparatus using a supercritical fluid that can remove floating particles is provided. The substrate processing apparatus comprises a vessel including a processing space for processing a substrate, and a first vessel and a second vessel configured to be combined to be open and closed, wherein the first vessel and the second vessel seal the processing space in a closed position, and the first vessel and the second vessel open the processing space in an open position; a clamping unit configured to clamp the first vessel and the second vessel in the closed position; and an intake unit configured to intake a particle by including an intake member positioned to correspond to an open space between the first vessel and the second vessel in the open position.