Substrate Processing Chamber Sealing for Particle-Free Opening
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Solution Overview
Problem
The existing substrate processing technologies face challenges in minimizing the introduction of external particles and air currents when opening the processing space, leading to potential contamination and pressure imbalances.
Innovation Solution
An apparatus and method that utilize a chamber with a driver to move its bodies relative to each other, creating a sealed and open position for the processing space. This design includes a support unit for substrates, fluid supply, and exhaust units, with specific protrusions and receiving portions to manage pressure and particle entry.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the processing space is opened to unload the substrate, then the substrate can be removed from the chamber, but external particles and air currents enter the processing space causing contamination
Solution Approach 1:
The exhaust unit operates in advance to equalize the pressure between the processing space and the external environment before the chamber is opened. This preliminary pressure equalization prevents negative pressure formation that would otherwise draw external particles and air currents into the processing space during opening, while still allowing substrate unloading to proceed
2Speed
If the processing space is opened rapidly, then the opening operation is efficient, but pressure imbalance causes external particles to be drawn into the processing space
Solution Approach 1:
The exhaust unit performs pressure equalization before the opening operation, so that when the chamber is opened at normal speed, no pressure differential exists to draw particles in. This allows the opening to be performed efficiently without requiring controlled slow opening
Solution Approach 2:
The exhaust unit acts as an intermediary mechanism that mediates between the sealed high-pressure processing space and the external atmosphere. By controlling the exhaust timing and rate, it smooths the pressure transition and prevents direct pressure imbalance that would cause particle introduction during opening
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively minimizes the introduction of external particles and air currents during the opening of the processing space, preventing contamination and maintaining pressure stability within the chamber.
Implementation Method 1
the pressure in the processing space is temporarily lower than that outside, which causes particles from the outside to enter
Implementation Method 2
a sealing member, and the first protrusion may be located further out than the sealing member in a radial direction of the chamber
Data Source
AI summary
Disclosed is an apparatus for processing a substrate, the apparatus including: a chamber for forming a processing space in which a processing process for a substrate is performed therein by a combination of a first body and a second body; and a driver for moving any one of the first body or the second body relative to the other such that a relative position between the first body and the second body is changeable between a sealed position at which the processing space is sealed from the outside and an open position at which the processing space is opened, in which the first body is formed with a first protrusion on a face that is in contact with the second body, the second body is formed with a first receiving portion, and the first protrusion is provided to be inserted into the first receiving portion when the first body and the second body are at the sealed position.