Substrate Processing Chamber Layout for Rear Vacuum Exhaust

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Solution Overview

Problem

The existing substrate processing apparatuses require large footprints due to maintenance areas, leading to high COO (Cost of Ownership) and inefficient exhaust systems.

Innovation Solution

A substrate processing apparatus design with a first processing module, a first utility system, and a first vacuum-exhauster where the vacuum-exhauster's outer side surface does not protrude beyond the utility system, optimizing the layout to reduce footprint and improve exhaust efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of repair

If a maintenance area is provided for maintaining mechanisms on the lateral side of the substrate processing apparatus, then the apparatus can be maintained, but the footprint becomes large

Engineering Contradiction:
Improvemaintenance accessibilityVSAvoidfootprint
Core Design Contradiction:
Ease of repairVSArea of stationary object

Solution Approach 1:

The patent repositions the vacuum exhauster from a lateral arrangement to a rearward arrangement behind the process chamber. This dimensional change allows maintenance access from the rear side rather than requiring lateral space, thereby reducing the footprint while maintaining ease of repair. The utility system is arranged to extend toward the rear surface, creating a coordinated layout that enables maintenance without increasing the lateral footprint.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Productivity

If the vacuum exhauster is arranged to improve exhaust efficiency, then exhaust performance improves, but the footprint may increase

Engineering Contradiction:
Improveexhaust efficiencyVSAvoidfootprint
Core Design Contradiction:
ProductivityVSArea of stationary object

Solution Approach 1:

The vacuum exhauster is positioned behind the process chamber rather than laterally, utilizing the rearward dimension. This arrangement optimizes the exhaust path and improves exhaust efficiency by directly facing the exhaust port, while simultaneously reducing the lateral footprint as the exhauster is contained within the rearward extension of the utility system.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The outer side surface of the vacuum exhauster is designed not to protrude beyond the outer side surface of the utility system, merging the boundaries of these components. This integration allows the exhauster to be positioned optimally for exhaust efficiency while being contained within the overall footprint defined by the utility system, thus improving exhaust performance without increasing the total footprint.

Inventive Principle:
Principle #5Merging (Combining)

3Area of stationary object

If the apparatus layout is optimized to reduce footprint, then COO decreases, but maintenance access may be restricted

Engineering Contradiction:
ImprovefootprintVSAvoidmaintenance access
Core Design Contradiction:
Area of stationary objectVSEase of repair

Solution Approach 1:

The maintenance access is shifted from lateral dimension to rearward dimension. The vacuum exhauster and utility system are arranged to extend toward the rear surface, allowing maintenance personnel to access mechanisms from the rear side. This dimensional shift maintains ease of repair while reducing the lateral footprint, as maintenance activities no longer require lateral clearance.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The utility system acts as an intermediary structure that extends toward the rear surface, facilitating both the positioning of the vacuum exhauster for optimal exhaust efficiency and providing access pathways for maintenance. This intermediary arrangement enables maintenance access without requiring direct lateral access to the process chamber, thus reducing footprint while maintaining ease of repair.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The design reduces the apparatus footprint and enhances exhaust efficiency, thereby lowering COO and improving operational performance.

Implementation Method 1

a first vacuum-exhauster arranged behind the first processing module and configured to exhaust an inside of the first process container

Methodology Applied
Scientific EffectVacuum: Vacuum

Data Source

PatentUS12518981B2Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
Publication Date: 2026.01.06 KOKUSAI DENKI KK
  • US12518981B2 patent drawing
  • US12518981B2 patent drawing
  • US12518981B2 patent drawing

AI summary

A substrate processing apparatus includes: a processing module including a process container in which at least one substrate is processed and a substrate loading port installed at a front side of the processing module, a utility system including a supply system which supplies a processing gas into the first process container and a surface of the first utility system is connected or arranged close to a rear surface of the processing module; a vacuum-exhauster behind the processing module and configured to exhaust an inside of the process container; an exhaust pipe that brings the process container into fluid communication with the vacuum-exhauster; a pipe housing which supports the exhaust pipe; and a first vibration-damping fastener connecting the vacuum-exhauster and the pipe housing. The exhaust pipe includes a first flexible portion that allows displacement of the exhaust pipe's end, and the vacuum-exhauster and pipe housing are installed at a floor.