Substrate Chamber Temperature Estimation for Faster Supercritical Drying
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Solution Overview
Problem
Conventional substrate processing apparatuses require a long time to regulate the internal space temperature due to their high heat storage capacity, leading to inefficient temperature control during supercritical drying processes.
Innovation Solution
A substrate processing apparatus with a controller that measures and estimates the setting temperature of the heating mechanism based on two different heating settings, allowing for efficient temperature regulation by plotting a linear correlation between heater and chamber temperatures, enabling quick and accurate temperature control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If the heating mechanism heats the internal space from outside, then the temperature can be regulated, but the high heat storage capacity causes long regulation time
Solution Approach 1:
The system performs preliminary measurements at two different setting temperatures to establish a linear correlation model before actual temperature regulation. This pre-established model enables direct calculation of required setting temperature, eliminating the need for time-consuming iterative adjustments during actual operation.
Solution Approach 2:
The system uses temperature measurement to detect the actual internal space temperature and feeds this information back to the controller. The controller then calculates the appropriate setting temperature adjustment based on the linear correlation, creating a closed-loop feedback system that achieves rapid and accurate temperature regulation.
2Temperature
If conventional temperature regulation methods are used, then temperature control is achieved, but electrical energy consumption is high
Solution Approach 1:
The system performs preliminary measurements at two different setting temperatures to establish a linear correlation model before actual temperature regulation. This pre-established model enables direct calculation of required setting temperature, eliminating the need for time-consuming iterative adjustments during actual operation.
Solution Approach 2:
The system changes the operating parameters by measuring at two distinct setting temperatures to establish a linear correlation model. This parameter-based approach allows the controller to calculate the precise setting temperature needed for any desired internal space temperature, optimizing energy usage.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for efficient temperature regulation in the processing container, reducing the time required to reach a desired temperature and minimizing electrical usage, thereby improving the efficiency of the supercritical drying process.
Implementation Method 1
a heating mechanism that heats the internal space from an outside of the internal space
Data Source
AI summary
A substrate processing apparatus includes a processing container that houses a substrate in an internal space thereof, a heating mechanism that heats the internal space from an outside of the internal space, a temperature measurement instrument that measures a temperature of the internal space, and a controller, wherein the controller has a measurement unit that measures a first temperature that is a temperature of the internal space in a case where the heating mechanism is heated at a first setting temperature and a second temperature that is a temperature of the internal space in a case where the heating mechanism is heated at a second setting temperature, and an estimation unit that estimates a setting temperature of the heating mechanism to set a temperature of the internal space at a desired temperature, based on the first setting temperature, the second setting temperature, the first temperature, and the second temperature.