Substrate Chamber Temperature Gating for Uniform Wafer Processing
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Solution Overview
Problem
Variations in surface temperatures of chamber components in substrate processing apparatuses can affect the quality of substrate processing, leading to inconsistent results across multiple substrates.
Innovation Solution
A substrate processing apparatus that includes a chamber, a substrate holder, first and second processors, temperature measurement parts, and a controller to determine when to start the second processing based on measured temperature information, ensuring temperature stability before proceeding with the second processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple substrates are processed sequentially in the chamber, then productivity is improved, but temperature variations of chamber members cause variations in processing quality
Solution Approach 1:
The patent applies preliminary action by performing a first processing step (such as heating or cooling) on the chamber members before the actual second processing of substrates begins. This preliminary processing stabilizes the temperature of chamber members like the base, nozzles, and cup, ensuring that when substrate processing occurs, the temperature environment is already stable and uniform, thereby preventing quality variations while maintaining sequential processing capability
Solution Approach 2:
The patent implements feedback by using temperature measurement parts to continuously monitor the temperature of chamber members during processing. The controller receives this temperature information and adjusts the processing conditions or timing accordingly, creating a closed-loop control system that maintains temperature stability and ensures uniform processing quality across multiple substrates
2Manufacturing precision
If temperature measurement and control is implemented, then processing quality uniformity is improved, but device complexity increases
Solution Approach 1:
The patent applies universality by designing the first processor to serve multiple functions: it can perform the primary substrate processing task and also function as a temperature stabilization mechanism through additional processing steps. The controller similarly manages multiple functions including process control, temperature monitoring coordination, and timing management, reducing the need for separate dedicated components and thereby limiting the increase in device complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for uniform second processing across multiple substrates by ensuring the temperature environment in the chamber has reached stability, reducing variations and improving processing quality.
Implementation Method 1
a first temperature measurement part that measures a temperature of a predetermined target region in the chamber
Data Source
AI summary
In a chamber, first processing is performed as preliminary processing. After the first processing has been finished, the temperature in a predetermined target region in the chamber is measured with a thermographic camera. Then, whether or not to start second processing on a substrate is determined in accordance with the acquired measured temperature information. If it is determined as a result that the second processing can be started, the second processing is performed. In this case, the second processing on the substrate can be started, with the temperature of the target region in the chamber having reached its stability. Accordingly, the second processing can be performed uniformly on a plurality of substrates. That is, it is possible to reduce variations in processing caused by temperature environments in the chamber.