Integrated Substrate Clean-Dry Rotor to Prevent Splash-Back
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Solution Overview
Problem
Conventional substrate cleaning processes in CMP systems face challenges in optimizing the final drying phase, leading to oxidation, contamination, and watermark formation due to splash-back of fluids, particularly on hydrophobic surfaces.
Innovation Solution
An integrated cleaning and drying module with a process rotor and collection rotor system, featuring grip pins, sweep arms with nozzles, and an exhaust system to manage fluid collection and drainage, ensuring efficient cleaning and drying without splash-back.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional dryer module uses a nozzle to flow fluid onto the substrate for final rinsing and drying, then the substrate can be cleaned and dried, but the water splashes and creates spray that splashes back onto the substrate surface, causing watermarks and oxidation
Solution Approach 1:
The patent merges the cleaning and drying functions into a single integrated module, where the process rotor and collection rotor work together to perform both cleaning and drying operations without transferring the substrate between separate modules, thereby eliminating the critical transfer step that causes contamination and oxidation
Solution Approach 2:
The collection rotor acts as an intermediary structure that collects and contains the cleaning fluid and spray, preventing it from splashing back onto the substrate. The collection rotor with its sidewall and bottom surface creates a containment zone that redirects fluid away from the substrate surface
2Adaptability or versatility
If the substrate is transferred from the cleaning module to the drying module, then the substrate can undergo separate cleaning and drying operations, but the transfer process creates opportunities for oxidation and contamination
Solution Approach 1:
The patent combines cleaning and drying operations into a single integrated module where both functions are performed on the substrate without transfer between modules. The process rotor performs cleaning while the collection rotor simultaneously performs drying, eliminating the critical transfer step that causes contamination
Solution Approach 2:
The integrated module serves multiple functions simultaneously - it can clean, rinse, and dry the substrate in a single operation. The system is designed to perform multiple substrate processing functions within one module, reducing the need for separate modules and transfers
3Manufacturing precision
If the collection rotor sidewall extends high above the process rotor, then fluid collection is improved, but the device complexity increases
Solution Approach 1:
The patent optimizes the sidewall height parameter to achieve effective fluid collection without excessive height. The sidewall extends above the process rotor to contain spray and fluid, but the height is controlled to balance collection efficiency with device simplicity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively reduces oxidation and contamination by collecting and draining fluids, maintaining a clean substrate surface, and preventing watermark formation during the final drying process.
Implementation Method 1
An exhaust is in communication with the drain holes. The exhaust is configured to draw air from the processing volume and the annular volume through the drain holes and to receive the collected fluids and particles.
Implementation Method 2
The collection rotor comprises a sidewall extending above the process rotor in the lowered position, an inner surface of the sidewall being angled inward from a lower portion to an upper portion. The collection rotor further comprises a collection weir defined by a bottom portion of the collection rotor and the inner surface. The collection weir is configured to collect fluids and particles from the process rotor and the substrate.
Data Source
AI summary
In one embodiment, a cleaning and drying module includes a process rotor having grip pins for holding a substrate. The process rotor rotates and moves between lowered and raised positions. A plurality of sweep arms each have a nozzle mechanism to apply a cleaning and/or drying fluid to the substrate. A collection rotor rotates synchronously with the process rotor. The collection rotor includes a collection weir defined by a bottom portion of the collection rotor and the inner surface. The collection weir collects fluids and particles from the process rotor and the substrate. Drain holes are positioned in the collection weir to drain fluids and particles from the collection weir. A rotor cover surrounds and extends above the sidewall of the collection rotor defining an annular volume between the rotor cover and the collection rotor. An exhaust draws air through the drain holes and receives the collected fluids and particles.