Integrated Substrate Clean-Dry Rotor to Prevent Fluid Splash-Back
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Solution Overview
Problem
Conventional substrate cleaning processes in CMP systems face challenges in optimizing the final drying phase, leading to oxidation, contamination, and watermark formation due to splash-back of cleaning fluids, particularly on hydrophobic surfaces.
Innovation Solution
An integrated cleaning and drying module with a process rotor and collection rotor system, featuring grip pins, sweep arms with nozzles, and an exhaust system to manage fluid collection and drainage, ensuring efficient cleaning and drying without splash-back.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a conventional dryer module uses a nozzle to flow fluid onto the substrate for final rinsing and drying, then the substrate can be rinsed and dried, but the water splashes and creates spray that splashes back onto the substrate surface, causing watermarks and oxidation
Solution Approach 1:
The patent introduces an intermediary collection rotor with a shroud that mediates between the substrate and the environment. The shroud acts as a barrier that captures and contains the cleaning fluid, preventing it from splashing back onto the substrate while allowing the drying process to continue effectively
Solution Approach 2:
The patent extracts the harmful splash-back effect by removing the cleaning fluid from the substrate surface environment. The collection rotor and shroud system captures and removes the fluid before it can re-deposit on the substrate, separating the drying function from the harmful fluid presence
2Reliability
If the substrate is transferred from the cleaning module to the drying module, then the substrate can be dried, but the transfer process creates opportunities for oxidation and contamination
Solution Approach 1:
The patent merges the cleaning and drying functions into a single integrated module. The substrate remains on the process rotor throughout both operations, eliminating the need for transfer between separate modules and thus preventing contamination during transfer while maintaining both cleaning and drying capabilities
Solution Approach 2:
The integrated module performs multiple functions (cleaning, rinsing, drying) within a single system. The process rotor serves as a universal platform that handles the substrate through all these operations without requiring removal or transfer, making the system multi-functional while maintaining substrate purity
3Manufacturing precision
If multiple cleaning stations are used to clean the substrate, then the substrate can be thoroughly cleaned, but the substrate becomes increasingly clean and the last transfer to drying is the most critical
Solution Approach 1:
The patent combines multiple cleaning functions (pre-clean, rinse, dry) into a single integrated module with one process rotor. This reduces the overall number of separate cleaning stations needed in the system while maintaining thorough cleaning quality through sequential operations within the unified module
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively reduces oxidation and contamination by collecting and draining fluids and particles, providing a clean and dry substrate surface, meeting contamination and defect requirements.
Implementation Method 1
An exhaust is in communication with the drain holes. The exhaust is configured to draw air from the processing volume and the annular volume through the drain holes and to receive the collected fluids and particles.
Implementation Method 2
The collection rotor comprises a sidewall extending above the process rotor in the lowered position, an inner surface of the sidewall being angled inward from a lower portion to an upper portion. The collection rotor further comprises a collection weir defined by a bottom portion of the collection rotor and the inner surface.
Data Source
AI summary
In one embodiment, a cleaning and drying module includes a process rotor having grip pins for holding a substrate. The process rotor rotates and moves between lowered and raised positions. A plurality of sweep arms each have a nozzle mechanism to apply a cleaning and/or drying fluid to the substrate. A collection rotor rotates synchronously with the process rotor. The collection rotor includes a collection weir defined by a bottom portion of the collection rotor and the inner surface. The collection weir collects fluids and particles from the process rotor and the substrate. Drain holes are positioned in the collection weir to drain fluids and particles from the collection weir. A rotor cover surrounds and extends above the sidewall of the collection rotor defining an annular volume between the rotor cover and the collection rotor. An exhaust draws air through the drain holes and receives the collected fluids and particles.