Substrate Rear-Side Cleaning With Inclined Annular Flow Control
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Solution Overview
Problem
Existing substrate cleaning technologies face challenges in effectively cleaning the rear surfaces of substrates, particularly in removing residual liquids and foreign substances from the support pins and peripheral members, due to limitations in liquid flow direction and distribution.
Innovation Solution
The substrate cleaning apparatus incorporates an annular member with an inclined surface and a dual supply system that rotates with the substrate, allowing cleaning liquids to flow radially inward or outward due to gravity or centrifugal force, directly targeting support pins and peripheral members without additional mechanisms, and includes a controller to manage different flow conditions for thorough cleaning.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a single supply part supplies cleaning liquid to the rear surface of the substrate, then the structure is simple, but the cleaning efficiency of support pins and peripheral members is insufficient
Solution Approach 1:
The cleaning liquid supply system is segmented into two distinct supply parts: a first supply part that supplies cleaning liquid to the rear surface of the substrate, and a second supply part that supplies cleaning liquid to the inclined surface of the annular member. This segmentation allows each supply part to independently clean different areas, thereby improving overall cleaning efficiency without requiring complex additional mechanisms for each function
Solution Approach 2:
The annular member with its inclined surface serves multiple functions: it collects cleaning liquid, directs flow along the inclined surface, and provides a cleaning path for the second supply part to reach support pins and peripheral members. This multi-functional design achieves enhanced cleaning capability without proportionally increasing device complexity
2Productivity
If cleaning liquid flows only from central portion to peripheral portion of the substrate, then the flow direction is simple, but residual liquids on support pins cannot be effectively removed
Solution Approach 1:
The annular member incorporates an inclined surface that curves along the radial direction, creating a natural flow path for cleaning liquid. This curved inclined surface guides the cleaning liquid from the peripheral portion of the substrate inward toward the support pins, enabling residual liquid removal without complex flow control mechanisms
Solution Approach 2:
The inclined surface of the annular member automatically directs the flow of cleaning liquid inward after the first supply part applies it to the substrate. The gravity-driven flow along the inclined surface naturally carries cleaning liquid and removed contaminants toward the center, where support pins are located, achieving self-service cleaning without additional active control
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables efficient and thorough removal of foreign substances from both support pins and peripheral members, improving the cleanliness of the substrate and apparatus components, while minimizing residual liquid transfer and enhancing cleaning effectiveness.
Implementation Method 1
When the cleaning liquid is supplied from the supply part to the rear surface of the rotating substrate, the cleaning liquid flows from the central portion to the peripheral portion of the rear surface of the substrate by virtue of a centrifugal force
Implementation Method 2
an annular member disposed to surround a periphery of the substrate supported on the support part and including an inclined surface that is inclined with respect to a horizontal plane in a diametrical direction of the annular member
Data Source
AI summary
A substrate cleaning apparatus includes: a support part configured to support a substrate by bring into contact with a rear surface of the substrate; an annular member disposed to surround a periphery of the substrate supported on the support part and including an inclined surface that is inclined with respect to a horizontal plane in a diametrical direction of the annular member; a rotation part configured to rotate the support part and the annular member; a first supply part configured to supply a cleaning liquid toward the rear surface of the substrate supported on the support part; and a second supply part configured to supply the cleaning liquid toward the inclined surface.