Substrate Processing Apparatus Cleaning Path Bypass

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Solution Overview

Problem

In substrate processing apparatuses, solid matter accumulation in certain spots can lead to decreased product yield, inaccurate chemical liquid discharge control, and increased operational complexity and costs due to the need for frequent filter replacement during cleaning processes.

Innovation Solution

A substrate processing apparatus with a chemical liquid processing section and a cleaning processing section, where the cleaning liquid and gas are alternately led to the chemical liquid pathway without passing through the filter, allowing for efficient cleaning of the pathway without filter replacement, and the use of a replacement solvent to maintain chemical liquid composition and reduce residue.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the cleaning liquid passes through the filter during cleaning, then the filter can be reused, but the cleaning liquid cannot effectively reach the valve to remove solid matter

Engineering Contradiction:
Improvefilter reuseabilityVSAvoidcleaning effectiveness
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The system divides the fluid path into two separate routes: one for chemical liquid that passes through the filter, and another for cleaning liquid that bypasses the filter. The switching unit segments the flow path to direct cleaning liquid through a different route (via the fourth pipe) that bypasses the filter, allowing effective cleaning of the valve without compromising filter integrity.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The switching unit acts as an intermediary device that controls and directs the flow of different liquids through different paths. It mediates between the cleaning liquid source and the valve, selecting whether to route cleaning liquid through the filter or bypass it, thereby enabling effective cleaning while preserving filter usability.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Ease of manufacture

If the filter is replaced frequently to ensure cleaning effectiveness, then solid matter removal is improved, but operation complexity and cost increase

Engineering Contradiction:
Improvesolid matter removal efficiencyVSAvoidcleaning operation complexity
Core Design Contradiction:
Ease of manufactureVSDevice complexity

Solution Approach 1:

The system performs preliminary routing of cleaning liquid through the bypass path before cleaning is actually needed. The switching unit is pre-configured with multiple pipes (second, third, and fourth pipes) that can direct cleaning liquid to the valve without passing through the filter, so when cleaning is required, the system can immediately effective clean without filter replacement.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The switching unit provides multi-functionality by being able to route both chemical liquid and cleaning liquid through different paths. It can switch between normal operation mode (chemical liquid through filter) and cleaning mode (cleaning liquid bypassing filter), eliminating the need for separate cleaning systems or frequent filter replacements.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Measurement precision

If the chemical liquid flows continuously through the filter, then discharge control is maintained, but solid matter accumulates in the valve

Engineering Contradiction:
Improvedischarge control accuracyVSAvoidsolid matter accumulation
Core Design Contradiction:
Measurement precisionVSObject-generated harmful factors

Solution Approach 1:

The system implements periodic cleaning cycles interrupting the continuous chemical liquid flow. During these periodic intervals, the switching unit directs cleaning liquid through the bypass path to the valve, alternately switching between chemical liquid supply and cleaning liquid supply, thereby removing accumulated solid matter while maintaining overall discharge control accuracy.

Inventive Principle:
Principle #19Periodic action

Solution Approach 2:

The system maintains continuous operational capability by providing an alternative path for cleaning liquid that bypasses the filter. This allows the chemical liquid to continuously flow through the filter for accurate discharge control, while the cleaning liquid can continuously or periodically flow through the bypass to prevent solid matter accumulation in the valve.

Inventive Principle:
Principle #20Continuity of useful action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The apparatus effectively prevents solid matter accumulation, maintains accurate chemical liquid discharge, and reduces operational complexity and costs by allowing continuous processing without filter replacement and minimizing the use of expensive chemical liquids.

Implementation Method 1

the cleaning liquid and the gas are alternately led to the flow path range a number of times

Methodology Applied
Scientific EffectFluid flow:

Implementation Method 2

a switching unit configured to be capable of switching a flow path in the first, second and third pipes such that the chemical liquid, the cleaning liquid and the gas are selectively led to a predetermined flow path range

Methodology Applied
Scientific EffectFluid flow control:

Implementation Method 3

The resist is purified by a filter on the route from the trap tank to the discharge nozzle

Methodology Applied
Scientific EffectFiltration: Filter (physical)

Implementation Method 4

a third pipe for leading a gas to the first pipe

Methodology Applied
Scientific EffectEvaporation: Evaporation

Data Source

PatentUS9436087B2Substrate processing apparatus with a cleaning processing section for cleaning a chemical liquid processing section
Publication Date: 2016.09.06 SCREEN SEMICON SOLUTIONS CO LTD
  • US9436087B2 patent drawing
  • US9436087B2 patent drawing
  • US9436087B2 patent drawing

AI summary

Each chemical processing section includes a chemical liquid bottle, a buffer tank, a pump, a filter, a discharge valve and a discharge nozzle. A chemical liquid stored in the chemical liquid bottle is led to the discharge nozzle and is discharged from the discharge nozzle to a substrate. A cleaning processing section includes a solvent bottle, a cleaning liquid bottle, the buffer tank and the pump. A solvent stored in the solvent bottle, a cleaning liquid stored in the cleaning liquid bottle and a gas supplied from a gas supply source are selectively led to the discharge nozzle in each chemical liquid processing section.